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Reactive Gas Source Epitaxy of Group IV Alloys for Si based Photonics
Grützmacher, D. (Corresponding author)FZJ* ; von den Driesch, N.FZJ* ; Wirths, S.FZJ* ; Stange, D.FZJ* ; Mantl, S.FZJ* ; Buca, D. M.FZJ* ; Hartmann, J. M. ; Geiger3, R. ; Sigg, H. ; Ikonic, Z.
2016
201618th International Conference on Crystal Growth and Epitaxy (ICCGE-18), NagoyaNagoya, Japan, 8 Aug 2016 - 12 Aug 20162016-08-082016-08-12
Contributing Institute(s):
- Halbleiter-Nanoelektronik (PGI-9)
- JARA-FIT (JARA-FIT)
Research Program(s):
- 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)
Appears in the scientific report
2017