Hauptseite > Publikationsdatenbank > Lasing from GeSn alloys deposited on Ge/Si (100) pseudo substrates by reactive gas source epitaxy > EndNote Text |
%0 Conference Paper %A Grützmacher, Detlev %T Lasing from GeSn alloys deposited on Ge/Si (100) pseudo substrates by reactive gas source epitaxy %M FZJ-2017-03929 %D 2015 %B Compound Semiconductor Week (CSW) %C 28 Jun 2015 - 3 Jul 2015, Santa Barbara (USA) Y2 28 Jun 2015 - 3 Jul 2015 M2 Santa Barbara, USA %F PUB:(DE-HGF)6 %9 Conference Presentation %U https://juser.fz-juelich.de/record/830376