Hauptseite > Publikationsdatenbank > Lasing from GeSn alloys deposited on Ge/Si (100) pseudo substrates by reactive gas source epitaxy > RIS |
TY - CONF AU - Grützmacher, Detlev TI - Lasing from GeSn alloys deposited on Ge/Si (100) pseudo substrates by reactive gas source epitaxy M1 - FZJ-2017-03929 PY - 2015 T2 - Compound Semiconductor Week (CSW) CY - 28 Jun 2015 - 3 Jul 2015, Santa Barbara (USA) Y2 - 28 Jun 2015 - 3 Jul 2015 M2 - Santa Barbara, USA LB - PUB:(DE-HGF)6 UR - https://juser.fz-juelich.de/record/830376 ER -