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@INPROCEEDINGS{Grtzmacher:830376,
      author       = {Grützmacher, Detlev},
      title        = {{L}asing from {G}e{S}n alloys deposited on {G}e/{S}i (100)
                      pseudo substrates by reactive gas source epitaxy},
      reportid     = {FZJ-2017-03929},
      year         = {2015},
      month         = {Jun},
      date          = {2015-06-28},
      organization  = {Compound Semiconductor Week (CSW),
                       Santa Barbara (USA), 28 Jun 2015 - 3
                       Jul 2015},
      subtyp        = {Invited},
      cin          = {PGI-9 / JARA-FIT},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)6},
      url          = {https://juser.fz-juelich.de/record/830376},
}