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@ARTICLE{Starschich:834524,
author = {Starschich, S. and Boettger, Ulrich},
title = {{A}n extensive study of the influence of dopants on the
ferroelectric properties of {H}f{O} 2},
journal = {Journal of materials chemistry / C},
volume = {5},
number = {2},
issn = {2050-7534},
address = {London [u.a.]},
publisher = {RSC},
reportid = {FZJ-2017-04453},
pages = {333 - 338},
year = {2017},
abstract = {The ferroelectric properties of hafnium oxide based thin
films prepared by chemical solution deposition (CSD) are
investigated. In this extensive study, a wealth of strongly
different dopants (size and valence) and dopant
concentrations is used to induce ferroelectricity in 42 nm
thin films. Using the same precursors and preparation
conditions for all dopants a good comparability is given. In
particular, the dopant size appears to have a crucial impact
on the resulting ferroelectric properties. For smaller
dopants only a small ferroelectric response is observed
whereas for larger dopants the remanent polarization is
increased significantly. The crystal phase for varying
dopant concentrations and dopant sizes is investigated by
grazing incidence X-ray diffractions (GI-XRD). A dominating
cubic phase is found for doping concentrations showing the
highest remanent polarization. Similar to first CSD studies
on Y:HfO2, this is reflected in a prominent wake-up
behavior, which is attributed to a phase transition from
cubic to orthorhombic during field cycling.},
cin = {PGI-7},
ddc = {540},
cid = {I:(DE-Juel1)PGI-7-20110106},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000392813800011},
doi = {10.1039/C6TC04807B},
url = {https://juser.fz-juelich.de/record/834524},
}