000835988 001__ 835988
000835988 005__ 20240711113518.0
000835988 0247_ $$2doi$$a10.1016/j.fusengdes.2017.04.123
000835988 0247_ $$2ISSN$$a0920-3796
000835988 0247_ $$2ISSN$$a1873-7196
000835988 0247_ $$2WOS$$aWOS:000418992000063
000835988 037__ $$aFZJ-2017-05113
000835988 041__ $$aEnglish
000835988 082__ $$a620
000835988 1001_ $$0P:(DE-HGF)0$$aLouche, F.$$b0$$eCorresponding author
000835988 245__ $$aDesign of an ICRF system for plasma–wall interactions and RF plasma production studies on TOMAS
000835988 260__ $$aNew York, NY [u.a.]$$bElsevier$$c2017
000835988 3367_ $$2DRIVER$$aarticle
000835988 3367_ $$2DataCite$$aOutput Types/Journal article
000835988 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1510581445_28476
000835988 3367_ $$2BibTeX$$aARTICLE
000835988 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000835988 3367_ $$00$$2EndNote$$aJournal Article
000835988 520__ $$aIon cyclotron wall conditioning (ICWC) is being developed for ITER and W7-X as a baseline conditioning technique in which the ion cyclotron heating and current drive system will be employed to produce and sustain the currentless conditioning plasma. The TOMAS project (TOroidal MAgnetized System, operated at the FZ-Juelich, Germany) proposes to explore several key aspects of ICWC.For this purpose we have designed an ICRF system made of a single strap antenna within a metallic box, connected to a feeding port and a pre-matching system. We discuss the design work of the antenna system with the help of the commercial electromagnetic software CST Microwave Studio®. The simulation results for a given geometry provide input impedance matrices for the two-port system. These matrices are afterwards inserted into various circuit models to assess the accessibility of the required frequency range.The sensitivity of the matching system to uncertainties on plasma loading and capacitance values is notably addressed. With a choice of three variable capacitors we show that the system can cope with such uncertainties. We also demonstrate that the system can cope as well with the high reflected power levels during the short breakdown phase of the RF discharge, but at the cost of a significantly reduced coupled power.Keywords
000835988 536__ $$0G:(DE-HGF)POF3-174$$a174 - Plasma-Wall-Interaction (POF3-174)$$cPOF3-174$$fPOF III$$x0
000835988 588__ $$aDataset connected to CrossRef
000835988 7001_ $$0P:(DE-Juel1)145890$$aWauters, T.$$b1
000835988 7001_ $$0P:(DE-Juel1)161584$$aRagona, R.$$b2
000835988 7001_ $$0P:(DE-Juel1)139534$$aMöller, S.$$b3
000835988 7001_ $$0P:(DE-Juel1)130003$$aDurodié, F.$$b4
000835988 7001_ $$0P:(DE-Juel1)130090$$aLitnovsky, A.$$b5
000835988 7001_ $$0P:(DE-Juel1)130093$$aLyssoivan, A.$$b6
000835988 7001_ $$0P:(DE-Juel1)130101$$aMessiaen, A.$$b7
000835988 7001_ $$0P:(DE-Juel1)5018$$aOngena, J.$$b8
000835988 7001_ $$0P:(DE-HGF)0$$aPetersson, P.$$b9
000835988 7001_ $$0P:(DE-HGF)0$$aRubel, M.$$b10
000835988 7001_ $$0P:(DE-Juel1)129976$$aBrezinsek, S.$$b11
000835988 7001_ $$0P:(DE-Juel1)157640$$aLinsmeier, Ch.$$b12
000835988 7001_ $$0P:(DE-HGF)0$$aSchoor, M. Van$$b13
000835988 773__ $$0PERI:(DE-600)1492280-0$$a10.1016/j.fusengdes.2017.04.123$$gp. S0920379617305264$$p317-320$$tFusion engineering and design$$v123$$x0920-3796$$y2017
000835988 8564_ $$uhttps://juser.fz-juelich.de/record/835988/files/1-s2.0-S0920379617305264-main.pdf$$yRestricted
000835988 8564_ $$uhttps://juser.fz-juelich.de/record/835988/files/1-s2.0-S0920379617305264-main.gif?subformat=icon$$xicon$$yRestricted
000835988 8564_ $$uhttps://juser.fz-juelich.de/record/835988/files/1-s2.0-S0920379617305264-main.jpg?subformat=icon-1440$$xicon-1440$$yRestricted
000835988 8564_ $$uhttps://juser.fz-juelich.de/record/835988/files/1-s2.0-S0920379617305264-main.jpg?subformat=icon-180$$xicon-180$$yRestricted
000835988 8564_ $$uhttps://juser.fz-juelich.de/record/835988/files/1-s2.0-S0920379617305264-main.jpg?subformat=icon-640$$xicon-640$$yRestricted
000835988 8564_ $$uhttps://juser.fz-juelich.de/record/835988/files/1-s2.0-S0920379617305264-main.pdf?subformat=pdfa$$xpdfa$$yRestricted
000835988 909CO $$ooai:juser.fz-juelich.de:835988$$pVDB
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)145890$$aForschungszentrum Jülich$$b1$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)139534$$aForschungszentrum Jülich$$b3$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130003$$aForschungszentrum Jülich$$b4$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130090$$aForschungszentrum Jülich$$b5$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130093$$aForschungszentrum Jülich$$b6$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130101$$aForschungszentrum Jülich$$b7$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)5018$$aForschungszentrum Jülich$$b8$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)129976$$aForschungszentrum Jülich$$b11$$kFZJ
000835988 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)157640$$aForschungszentrum Jülich$$b12$$kFZJ
000835988 9131_ $$0G:(DE-HGF)POF3-174$$1G:(DE-HGF)POF3-170$$2G:(DE-HGF)POF3-100$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bEnergie$$lKernfusion$$vPlasma-Wall-Interaction$$x0
000835988 9141_ $$y2017
000835988 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000835988 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bFUSION ENG DES : 2015
000835988 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000835988 915__ $$0StatID:(DE-HGF)0600$$2StatID$$aDBCoverage$$bEbsco Academic Search
000835988 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bASC
000835988 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bThomson Reuters Master Journal List
000835988 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000835988 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000835988 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000835988 915__ $$0StatID:(DE-HGF)1160$$2StatID$$aDBCoverage$$bCurrent Contents - Engineering, Computing and Technology
000835988 915__ $$0StatID:(DE-HGF)9900$$2StatID$$aIF < 5
000835988 9201_ $$0I:(DE-Juel1)IEK-4-20101013$$kIEK-4$$lPlasmaphysik$$x0
000835988 9201_ $$0I:(DE-Juel1)IEK-1-20101013$$kIEK-1$$lWerkstoffsynthese und Herstellungsverfahren$$x1
000835988 980__ $$ajournal
000835988 980__ $$aVDB
000835988 980__ $$aI:(DE-Juel1)IEK-4-20101013
000835988 980__ $$aI:(DE-Juel1)IEK-1-20101013
000835988 980__ $$aUNRESTRICTED
000835988 981__ $$aI:(DE-Juel1)IFN-1-20101013
000835988 981__ $$aI:(DE-Juel1)IMD-2-20101013