000836446 001__ 836446
000836446 005__ 20210129231008.0
000836446 037__ $$aFZJ-2017-05567
000836446 1001_ $$0P:(DE-Juel1)167340$$aKarimzadah, Soraya$$b0$$eCorresponding author
000836446 245__ $$aAtomic layer deposition of Al2O3 towards the in-situ fabrication of gate stacks on GaAs substrates$$f - 2017-05-31
000836446 260__ $$c2017
000836446 300__ $$a85p.
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000836446 502__ $$aSiegen, Masterarbeit, 2017$$bMS$$cSiegen$$d2017
000836446 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000836446 650_7 $$xMasterarbeit
000836446 7001_ $$0P:(DE-Juel1)128603$$aLepsa, Mihail Ion$$b1$$eThesis advisor
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000836446 9141_ $$y2017
000836446 920__ $$lyes
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