TY  - THES
AU  - Karimzadah, Soraya
TI  - Atomic layer deposition of Al2O3 towards the in-situ fabrication of gate stacks on GaAs substrates
PB  - Siegen
VL  - MS
M1  - FZJ-2017-05567
SP  - 85p.
PY  - 2017
N1  - Siegen, Masterarbeit, 2017
LB  - PUB:(DE-HGF)19
UR  - https://juser.fz-juelich.de/record/836446
ER  -