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@MASTERSTHESIS{Karimzadah:836446,
      author       = {Karimzadah, Soraya},
      othercontributors = {Lepsa, Mihail Ion},
      title        = {{A}tomic layer deposition of {A}l2{O}3 towards the in-situ
                      fabrication of gate stacks on {G}a{A}s substrates},
      school       = {Siegen},
      type         = {MS},
      reportid     = {FZJ-2017-05567},
      pages        = {85p.},
      year         = {2017},
      note         = {Siegen, Masterarbeit, 2017},
      cin          = {PGI-9},
      cid          = {I:(DE-Juel1)PGI-9-20110106},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)19},
      url          = {https://juser.fz-juelich.de/record/836446},
}