%0 Conference Paper
%A Hardtdegen, Alexander
%A Zhang, Hehe
%A Hoffmann-Eifert, Susanne
%T Comparison of plasma-enhanced and thermal atomic layer deposited TiO2 for the integration into HfO2/TiO2-based resistive switching devices
%M FZJ-2017-06526
%D 2017
%B European Materials Research Meeting
%C 18 Sep 2017 - 22 Sep 2017, Warsaw (Poland)
Y2 18 Sep 2017 - 22 Sep 2017
M2 Warsaw, Poland
%F PUB:(DE-HGF)24
%9 Poster
%U https://juser.fz-juelich.de/record/837648