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@ARTICLE{Rieger:841497,
author = {Rieger, Torsten and Zellekens, Patrick and Demarina,
Nataliya and Hassan, Ali Al and Hackemüller, Franz Josef
and Lüth, Hans and Pietsch, Ullrich and Schäpers, Thomas
and Grützmacher, Detlev and Lepsa, Mihail Ion},
title = {{S}train relaxation and ambipolar electrical transport in
{G}a{A}s/{I}n{S}b core–shell nanowires},
journal = {Nanoscale},
volume = {9},
number = {46},
issn = {2040-3372},
address = {Cambridge},
publisher = {RSC Publ.},
reportid = {FZJ-2017-08541},
pages = {18392 - 18401},
year = {2017},
abstract = {The growth, crystal structure, strain relaxation and room
temperature transport characteristics of GaAs/InSb
core–shell nanowires grown using molecular beam epitaxy
are investigated. Due to the large lattice mismatch between
GaAs and InSb of $14\%,$ a transition from island-based to
layer-like growth occurs during the formation of the shell.
High resolution transmission electron microscopy in
combination with geometric phase analyses as well as X-ray
diffraction with synchrotron radiation are used to
investigate the strain relaxation and prove the existence of
different dislocations relaxing the strain on zinc blende
and wurtzite core–shell nanowire segments. While on the
wurtzite phase only Frank partial dislocations are found,
the strain on the zinc blende phase is relaxed by
dislocations with perfect, Shockley partial and Frank
partial dislocations. Even for ultrathin shells of about 2
nm thickness, the strain caused by the high lattice mismatch
between GaAs and InSb is relaxed almost completely. Transfer
characteristics of the core–shell nanowires show an
ambipolar conductance behavior whose strength strongly
depends on the dimensions of the nanowires. The
interpretation is given based on an electronic band profile
which is calculated for completely relaxed core/shell
structures. The peculiarities of the band alignment in this
situation implies simultaneously occupied electron and hole
channels in the InSb shell. The ambipolar behavior is then
explained by the change of carrier concentration in both
channels by the gate voltage.},
cin = {PGI-9 / JARA-FIT / IBN-2 / PGI-10},
ddc = {600},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$ /
I:(DE-Juel1)IBN-2-20090406 / I:(DE-Juel1)PGI-10-20170113},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000416824100031},
doi = {10.1039/C7NR05201D},
url = {https://juser.fz-juelich.de/record/841497},
}