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000844535 005__ 20240712084452.0
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000844535 0247_ $$2URN$$aurn:nbn:de:0001-2018032818
000844535 0247_ $$2ISSN$$a1866-1793
000844535 020__ $$a978-3-95806-289-4
000844535 037__ $$aFZJ-2018-01942
000844535 041__ $$aGerman
000844535 041__ $$aGerman
000844535 1001_ $$0P:(DE-Juel1)151151$$aFink, Thomas$$b0$$eCorresponding author$$gmale$$ufzj
000844535 245__ $$aBetrachtung der Kristallinitätsentwicklung in mikrokristallinem Dünnschicht-Siliziummit in-situ Raman-Spektroskopie$$f- 2017-07-20
000844535 260__ $$aJülich$$bForschungszentrum Jülich GmbH Zenralbibliothek, Verlag$$c2018
000844535 300__ $$aXI, 166 S.
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000844535 3367_ $$0PUB:(DE-HGF)11$$2PUB:(DE-HGF)$$aDissertation / PhD Thesis$$bphd$$mphd$$s1521540661_25110
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000844535 4900_ $$aSchriften des Forschungszentrums Jülich Reihe Energie & Umwelt / Energy & Environment$$v405
000844535 502__ $$aRWTH Aachen, Diss., 2017$$bDissertation$$cRWTH Aachen$$d2017
000844535 520__ $$aIn this thesis, the correlation between the preparation of hydrogenerated microcrystalline silicon ($\mu$c-Si:H), the evolution of the crystalline volume fraction and the performance of thin-film silicon solar cells is investigated. Microcrystalline silicon is a heterogeneous mixed phase material, composed of crystalline and amorphous domains, grain boundaries and voids.For the fabrication of $\mu$c-Si:H plasma enhanced chemical vapor deposition (PECVD) is acommonly used technique. The crystalline volume fraction of $\mu$c-Si:H is of fundamental importance for the material quality and can be estimated by the Raman crystallinity. Most favorable material properties for the application as absorber layer in solar cells are detected close to the transition to hydrogenated amorphous silicon (a-Si:H) and for Raman crystallinities between 60 % and 70 %. To characterize the evolution of the Raman crystallinity in growth direction, an institution’s internal setup was used that enables the monitoring of Raman spectra during the silicon deposition with high depth resolution of < 10 nm. The already existing setup was developed further in this thesis: A coating protection was designed to reduce the coating rate on the Raman optics in the PECVD-reactor by one order of magnitude. Moreover, the optical materials were optimized for the detection of the Raman spectra of $\mu$c-Si:H and the data analysis was automatized. [...]
000844535 536__ $$0G:(DE-HGF)POF3-121$$a121 - Solar cells of the next generation (POF3-121)$$cPOF3-121$$fPOF III$$x0
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000844535 9141_ $$y2018
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