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@PHDTHESIS{Caspers:845780,
author = {Caspers, Christian},
title = {{M}agnetic oxide heterostructures : {E}u{O} on cubic oxides
and on silicon},
volume = {69},
school = {Universität Duisburg},
type = {Dr},
address = {Jülich},
publisher = {Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag},
reportid = {FZJ-2018-02989},
isbn = {978-3-89336-891-4},
series = {Schriften des Forschungszentrums Jülich. Reihe
Schlüsseltechnologien / Key Technologies},
pages = {XIII, 152 S.},
year = {2013},
note = {Universität Duisburg, Diss., 2013},
abstract = {In the thesis at hand, we explore fundamental properties of
ultrathin europium oxide (EuO) films. EuO is a model system
of a localized 4$\textit{f}$ Heisenberg ferromagnet, in
which the ferromagnetic coupling– provided a high
crystalline quality – can be tuned by biaxial lattice
strain. Moreover, the magnetic oxide EuO is perfectly suited
as a spin-functional tunnel contact for silicon spintronics.
However, upto now a challenging bulk and interface chemistry
of EuO and Si has hampered a seamless integrationinto
functional silicon heterostructures.In order to investigate
fundamental aspects of the magnetic and electronic structure
of ultrathin EuO,in the first part of this thesis, we
synthesize EuO thin films on conductive YSZ substrates from
bulk-like thicknesses down to one nanometer by oxide
molecular beam epitaxy (MBE). The EuO thin films are of
textbook-like single-crystalline quality, and show bulk-like
magnetic properties. We control the stoichiometry of buried
EuO thin films by hard X-ray photoemission spectroscopy
(HAXPES); even a 1 nm ultrathin EuO film exhibits no valence
change or interface shifts. Furthermore, we conduct an
advanced magnetic characterization by the magnetic circular
dichroism (MCD) of Eu core-levels in photoemission, this
gives us insight into the intra-atomic exchange coupling of
EuO thin films. The MCD reveals large asymmetries of up to
49\% in the well-resolved Eu $\textit{4d}$ photoemission
multiplet. Thus, ultrathin EuO coherently grown on
conductive YSZ allows us to explore fundamental magnetic and
electronic properties of a $\textit{4f}$ magnetic oxide.
Biaxial lateral strain applied to single-crystalline EuO is
of fundamental interest, since it alters the electronic
structure and magnetic coupling in a controlled way. We
apply +4.2\% tensile biaxial strain to EuO by epitaxial
EuO/LaAlO$_{3}$ (100) heterostructures. EuO seamlessly
adapts the lateral lattice parameter of LaAlO$_{3}$, while
the perpendicular parameter of EuO is the unchanged EuO bulk
value, thus the strained EuO thin film shows a Poisson ratio
of ν$_{EuO}$ ≈ 0. The tensile strain reduces the Curie
temperature significantly by 12.3 K. The MCD effect provides
an advanced magnetic characterization:theMCDasymmetries in
Eu core-level photoemission reveal a larger reduction due to
the tensile strain than obtained from bulk-averaging SQUID
measurements. Thus, the mechanism of tensile strain on
intra-atomic exchange (indicated by MCD) is significantly
different than on the spin order of the 4$\textit{f}^{7}$
shell (indicated by SQUID). Experiments on EuO by MCD,
thereby, reveal exciting perspectives for studying
fundamental magnetic properties of EuO. In the second part
of this thesis, we explore how to integrate EuO directly
with Si (001). We focus on interface engineering of
structural and chemical properties of the EuO/Si (001)
spin-functional hetero interface. In response to the
extremely high chemical reactivity and pronounced surface
kinetics ofEu, EuO, and Si during EuO synthesis at elevated
temperatures, we initially conduct a thermodynamic analysis
of the EuO/Si interface. In this way, we decide to
investigate three in situ passivation techniques for the Si
(001) surface, in order to prevent metallic and oxide
contaminations at the EuO/Si interface – both being main
antagonists for spin-selective tunneling. We conduct a
comprehensive optimization study of the EuO/Si
heterointerface by tuning the passivation parameters of the
Si (001)surface and the growth parameters of EuO. Using
HAXPES, we evaluate Si and Eu core-level spectra and
determine the minimum of interface contaminants as
d$_{opt}$(SiO$_{x}$) = 0.69 nm concomitant with
d$_{opt}$(EuSi$_{2}$) = 0.20 nm, both of which are clearly
in the subnanometer regime. In conclusion, our ultrathin
EuO/Si (001) heterostructures reveal a high chemical quality
of the spinfunctionalinterface, combined with magnetic
properties of the EuO layer akin to bulk. By selected
interface passivation methods, we achieve a reduction of
residual contaminations to clearly below a closed interface
coverage. Thus, we could confirm a heteroepitaxial
integration of EuO on Si (001), which is the experimental
basis for possible band-matched coherent tunneling. This is
the first time that a direct integration of high quality EuO
on silicon was experimentally realized – without insertion
of additional oxide buffer layers. Such optimized EuO/Si
(001) heterointerfaces are paving the pathway for
near-future spin-functional devices using EuO tunnel
contacts.},
keywords = {Europiumoxide (gnd) / Dünne Schicht (gnd) / Silicium
(gnd)},
cin = {PGI-6},
ddc = {500},
cid = {I:(DE-Juel1)PGI-6-20110106},
pnm = {899 - ohne Topic (POF3-899)},
pid = {G:(DE-HGF)POF3-899},
typ = {PUB:(DE-HGF)3 / PUB:(DE-HGF)11},
url = {https://juser.fz-juelich.de/record/845780},
}