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000848173 1001_ $$0P:(DE-Juel1)165926$$aHensling, Felix$$b0$$eCorresponding author
000848173 245__ $$aUV radiation enhanced oxygen vacancy formation caused by the PLD plasma plume
000848173 260__ $$aLondon$$bNature Publishing Group$$c2018
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000848173 520__ $$aPulsed Laser Deposition is a commonly used non-equilibrium physical deposition technique for the growth of complex oxide thin films. A wide range of parameters is known to influence the properties of the used samples and thin films, especially the oxygen-vacancy concentration. One parameter has up to this point been neglected due to the challenges of separating its influence from the influence of the impinging species during growth: the UV-radiation of the plasma plume. We here present experiments enabled by a specially designed holder to allow a separation of these two influences. The influence of the UV-irradiation during pulsed laser deposition on the formation of oxygen-vacancies is investigated for the perovskite model material SrTiO3. The carrier concentration of UV-irradiated samples is nearly constant with depth and time. By contrast samples not exposed to the radiation of the plume show a depth dependence and a decrease in concentration over time. We reveal an increase in Ti-vacancy–oxygen-vacancy-complexes for UV irradiated samples, consistent with the different carrier concentrations. We find a UV enhanced oxygen-vacancy incorporation rate as responsible mechanism. We provide a complete picture of another influence parameter to be considered during pulsed laser depositions and unravel the mechanism behind persistent-photo-conductivity in SrTiO3.
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000848173 7001_ $$0P:(DE-HGF)0$$aKeeble, D. J.$$b1
000848173 7001_ $$0P:(DE-Juel1)142452$$aZhu, J.$$b2
000848173 7001_ $$0P:(DE-HGF)0$$aBrose, S.$$b3
000848173 7001_ $$0P:(DE-Juel1)156312$$aXu, C.$$b4
000848173 7001_ $$0P:(DE-Juel1)130677$$aGunkel, F.$$b5
000848173 7001_ $$0P:(DE-HGF)0$$aDanylyuk, S.$$b6
000848173 7001_ $$00000-0002-5369-9279$$aNonnenmann, S. S.$$b7
000848173 7001_ $$0P:(DE-HGF)0$$aEgger, W.$$b8
000848173 7001_ $$0P:(DE-Juel1)130620$$aDittmann, R.$$b9
000848173 773__ $$0PERI:(DE-600)2615211-3$$a10.1038/s41598-018-27207-5$$gVol. 8, no. 1, p. 8846$$n1$$p8846$$tScientific reports$$v8$$x2045-2322$$y2018
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