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@ARTICLE{Skaja:849842,
author = {Skaja, Katharina and Andrä, Michael and Rana, Vikas and
Waser, Rainer and Dittmann, Regina and Baeumer, Christoph},
title = {{R}eduction of the forming voltage through tailored oxygen
non-stoichiometry in tantalum oxide {R}e{RAM} devices},
journal = {Scientific reports},
volume = {8},
number = {1},
issn = {2045-2322},
address = {London},
publisher = {Nature Publishing Group},
reportid = {FZJ-2018-03945},
pages = {10861},
year = {2018},
abstract = {In this study, we investigated the influence of oxygen
non-stoichiometry on the resistive switching performance of
tantalum oxide based memristive devices. Thin-films of
tantalum oxide were deposited with varying sputter power and
oxygen partial pressure. The electroforming voltage was
found to decrease with increasing power density or decreased
oxygen partial pressure, while the endurance remained stable
and the resistance window ROFF/RON was found to increase.
In-depth XPS analysis connects these observations to a
controllable oxygen sub-stoichiometry in the
sputter-deposited films. Our analysis shows that the
decrease of the forming voltage results from an increase in
carrier density in the as-prepared thin-films, which is
induced by the presence of oxygen vacancies.},
cin = {PGI-7},
ddc = {000},
cid = {I:(DE-Juel1)PGI-7-20110106},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
pubmed = {pmid:30022129},
UT = {WOS:000439026000022},
doi = {10.1038/s41598-018-28992-9},
url = {https://juser.fz-juelich.de/record/849842},
}