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| 001 | 859062 | ||
| 005 | 20210130000150.0 | ||
| 010 | _ | _ | |a |
| 020 | _ | _ | |a 978-1-5386-4811-7 |
| 020 | _ | _ | |a 9781538648100 |
| 020 | _ | _ | |a 9781538648124 (print) |
| 024 | 7 | _ | |a 10.1109/ULIS.2018.8354771 |2 doi |
| 037 | _ | _ | |a FZJ-2019-00013 |
| 041 | _ | _ | |a English |
| 100 | 1 | _ | |a Liu, Mingshan |0 P:(DE-Juel1)173033 |b 0 |e Corresponding author |
| 111 | 2 | _ | |a 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) |c Granada |d 2018-03-19 - 2018-03-21 |w Spain |
| 245 | _ | _ | |a Realization of vertical Ge nanowires for gate-all-around transistors |
| 260 | _ | _ | |a Piscataway, NJ |c 2018 |b IEEE |
| 295 | 1 | 0 | |a [Ebook] EUROSOI-ULIS 2018 : 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS) : Granada, March 19-21, 2018 / Gámiz, Francisco , Piscataway, NJ : IEEE, 2018, |
| 300 | _ | _ | |a 1-3 |
| 336 | 7 | _ | |a CONFERENCE_PAPER |2 ORCID |
| 336 | 7 | _ | |a Conference Paper |0 33 |2 EndNote |
| 336 | 7 | _ | |a INPROCEEDINGS |2 BibTeX |
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| 520 | _ | _ | |a Towards gate-all-around (GAA) FETs, we present the top-down realization of vertical Ge nanowires (NWs) with defect-free sidewall and perfect anisotropy. The NW patterns are transferred by a novel inductively coupled plasma reactive ion etching (ICP-RIE) technique. With optimized etching conditions, sub-60 nm diameter Ge nanowires are guaranteed while mitigating micro-trenching and under-cutting effects. To further shrink the NW diameter, digital etching is followed including multiple cycles of self-limited O2 plasma oxidation and diluted HF rinsing. O2 plasma is also utilized for surface passivation in Ge MOScaps to improve the high-k/Ge interface. These NWs form the base of vertical transistors which are simulated by TCAD tools here. The processing techniques proposed in this work provide a viable option for low power vertical Ge and GeSn NW transistors. |
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| 773 | _ | _ | |a 10.1109/ULIS.2018.8354771 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/859062/files/08354771.pdf |y Restricted |
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| 914 | 1 | _ | |y 2018 |
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