000859113 001__ 859113
000859113 005__ 20240711114058.0
000859113 0247_ $$2doi$$a10.1016/j.nme.2018.12.008
000859113 0247_ $$2Handle$$a2128/21166
000859113 0247_ $$2WOS$$aWOS:000460107500013
000859113 037__ $$aFZJ-2019-00055
000859113 082__ $$a624
000859113 1001_ $$0P:(DE-HGF)0$$aNishijima, D.$$b0$$eCorresponding author
000859113 245__ $$aInfluence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices
000859113 260__ $$aAmsterdam [u.a.]$$bElsevier$$c2019
000859113 3367_ $$2DRIVER$$aarticle
000859113 3367_ $$2DataCite$$aOutput Types/Journal article
000859113 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1547480983_19393
000859113 3367_ $$2BibTeX$$aARTICLE
000859113 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000859113 3367_ $$00$$2EndNote$$aJournal Article
000859113 520__ $$aSurface morphology development and sputtering behavior of Cr, as a test material, have been explored under He plasma exposure at a low incident ion energy of ∼80 eV in multiple linear plasma devices: PISCES-A, PSI-2, and NAGDIS-II. From comparison of the experiments in these devices, deposition of a small amount of heavier impurities (Mo in NAGDIS-II and Ta in PISCES-A) onto Cr is found to result in the formation of cone structures on the Cr surface due to preferential sputtering, resulting in a significant reduction (up to ∼10 times) in the sputtering yield of Cr due to line-of-sight redeposition onto the neighboring cones. The heavier impurities are thought to originate from a sample holding cap/cover, which can be sputtered by a trace amount of intrinsic impurities (C, O, etc) as well as by Cr ionized in the plasma. It can be concluded from the Cr experiments, as well as additional Be data collected in PISCES-B, that heavier impurity deposition plays a major role in the cone structure formation, while other mechanisms (e.g. surface irregularity and oxide) also exist.
000859113 536__ $$0G:(DE-HGF)POF3-113$$a113 - Methods and Concepts for Material Development (POF3-113)$$cPOF3-113$$fPOF III$$x0
000859113 588__ $$aDataset connected to CrossRef
000859113 7001_ $$0P:(DE-Juel1)130070$$aKreter, A.$$b1
000859113 7001_ $$0P:(DE-HGF)0$$aBaldwin, M. J.$$b2
000859113 7001_ $$0P:(DE-Juel1)7884$$aBorodin, D.$$b3
000859113 7001_ $$0P:(DE-Juel1)171509$$aEksaeva, A.$$b4$$ufzj
000859113 7001_ $$0P:(DE-HGF)0$$aHwangbo, D.$$b5
000859113 7001_ $$00000-0003-0543-5241$$aKajita, S.$$b6
000859113 7001_ $$0P:(DE-HGF)0$$aMiyamoto, M.$$b7
000859113 7001_ $$0P:(DE-HGF)0$$aOhno, N.$$b8
000859113 7001_ $$0P:(DE-HGF)0$$aPatino, M.$$b9
000859113 7001_ $$0P:(DE-Juel1)130122$$aPospieszczyk, A.$$b10$$ufzj
000859113 7001_ $$0P:(DE-Juel1)162160$$aRasinski, M.$$b11$$ufzj
000859113 7001_ $$0P:(DE-Juel1)130142$$aSchlummer, T.$$b12
000859113 7001_ $$0P:(DE-Juel1)130166$$aTerra, A.$$b13$$ufzj
000859113 7001_ $$0P:(DE-HGF)0$$aDoerner, R. P.$$b14
000859113 773__ $$0PERI:(DE-600)2808888-8$$a10.1016/j.nme.2018.12.008$$gVol. 18, p. 67 - 71$$p67 - 71$$tNuclear materials and energy$$v18$$x2352-1791$$y2019
000859113 8564_ $$uhttps://juser.fz-juelich.de/record/859113/files/1-s2.0-S2352179118300619-main.pdf$$yOpenAccess
000859113 8564_ $$uhttps://juser.fz-juelich.de/record/859113/files/1-s2.0-S2352179118300619-main.pdf?subformat=pdfa$$xpdfa$$yOpenAccess
000859113 909CO $$ooai:juser.fz-juelich.de:859113$$pdnbdelivery$$pdriver$$pVDB$$popen_access$$popenaire
000859113 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130070$$aForschungszentrum Jülich$$b1$$kFZJ
000859113 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)7884$$aForschungszentrum Jülich$$b3$$kFZJ
000859113 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)171509$$aForschungszentrum Jülich$$b4$$kFZJ
000859113 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130122$$aForschungszentrum Jülich$$b10$$kFZJ
000859113 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)162160$$aForschungszentrum Jülich$$b11$$kFZJ
000859113 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130166$$aForschungszentrum Jülich$$b13$$kFZJ
000859113 9131_ $$0G:(DE-HGF)POF3-113$$1G:(DE-HGF)POF3-110$$2G:(DE-HGF)POF3-100$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bEnergie$$lEnergieeffizienz, Materialien und Ressourcen$$vMethods and Concepts for Material Development$$x0
000859113 9141_ $$y2019
000859113 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000859113 915__ $$0LIC:(DE-HGF)CCBYNCND4$$2HGFVOC$$aCreative Commons Attribution-NonCommercial-NoDerivs CC BY-NC-ND 4.0
000859113 915__ $$0StatID:(DE-HGF)0501$$2StatID$$aDBCoverage$$bDOAJ Seal
000859113 915__ $$0StatID:(DE-HGF)0112$$2StatID$$aWoS$$bEmerging Sources Citation Index
000859113 915__ $$0StatID:(DE-HGF)0500$$2StatID$$aDBCoverage$$bDOAJ
000859113 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000859113 915__ $$0StatID:(DE-HGF)0510$$2StatID$$aOpenAccess
000859113 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bDOAJ : Peer review
000859113 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bClarivate Analytics Master Journal List
000859113 9201_ $$0I:(DE-Juel1)IEK-4-20101013$$kIEK-4$$lPlasmaphysik$$x0
000859113 9801_ $$aFullTexts
000859113 980__ $$ajournal
000859113 980__ $$aVDB
000859113 980__ $$aUNRESTRICTED
000859113 980__ $$aI:(DE-Juel1)IEK-4-20101013
000859113 981__ $$aI:(DE-Juel1)IFN-1-20101013