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000859760 1001_ $$0P:(DE-Juel1)130217$$aBeyer, Wolfhard$$b0$$eCorresponding author
000859760 245__ $$aTemperature and hydrogen diffusion length in hydrogenated amorphous silicon films on glass while scanning with a continuous wave laser at 532 nm wavelength
000859760 260__ $$aMelville, NY$$bAmerican Inst. of Physics$$c2018
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000859760 520__ $$aRapid thermal annealing by, e.g., laser scanning of hydrogenated amorphous silicon (a-Si:H) films is of interest for device improvement and for development of new device structures for solar cell and large area display application. For well controlled annealing of such multilayers, precise knowledge of temperature and/or hydrogen diffusion length in the heated material is required but unavailable so far. In this study, we explore the use of deuterium (D) and hydrogen (H) interdiffusion during laser scanning (employing a continuous wave laser at 532 nm wavelength) to characterize both quantities. The evaluation of temperature from hydrogen diffusion data requires knowledge of the high temperature (T > 500 °C) deuterium-hydrogen (D-H) interdiffusion Arrhenius parameters for which, however, no experimental data exist. Using data based on recent model considerations, we find for laser scanning of single films on glass substrates a broad scale agreement with experimental temperature data obtained by measuring the silicon melting point and with calculated data using a physical model as well as published work. Since D-H interdiffusion measures hydrogen diffusion length and temperature within the silicon films by a memory effect, the method is capable of determining both quantities precisely also in multilayer structures, as is demonstrated for films underneath metal contacts. Several applications are discussed. Employing literature data of laser-induced temperature rise, laser scanning is used to measure the H diffusion coefficient at T > 500 °C in a-Si:H. The model-based high temperature hydrogen diffusion parameters are confirmed with important implications for the understanding of hydrogen diffusion in the amorphous silicon material
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000859760 7001_ $$0P:(DE-HGF)0$$aAndrä, Gudrun$$b1
000859760 7001_ $$0P:(DE-HGF)0$$aBergmann, Joachim$$b2
000859760 7001_ $$0P:(DE-Juel1)133840$$aBreuer, Uwe$$b3
000859760 7001_ $$0P:(DE-Juel1)130238$$aFinger, Friedhelm$$b4$$ufzj
000859760 7001_ $$0P:(DE-HGF)0$$aGawlik, Annett$$b5
000859760 7001_ $$0P:(DE-Juel1)130246$$aHaas, Stefan$$b6$$ufzj
000859760 7001_ $$0P:(DE-Juel1)130263$$aLambertz, Andreas$$b7$$ufzj
000859760 7001_ $$0P:(DE-Juel1)157955$$aMaier, Florian C.$$b8
000859760 7001_ $$0P:(DE-HGF)0$$aNickel, Norbert H.$$b9
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000859760 773__ $$0PERI:(DE-600)1476463-5$$a10.1063/1.5038090$$gVol. 124, no. 15, p. 153103 -$$n15$$p153103 -$$tJournal of applied physics$$v124$$x1089-7550$$y2018
000859760 8564_ $$uhttps://juser.fz-juelich.de/record/859760/files/1.5038090.pdf$$yPublished on 2018-10-19. Available in OpenAccess from 2019-10-19.
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