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@PHDTHESIS{Grootoonk:862854,
      author       = {Grootoonk, Björn},
      title        = {{E}ntwicklung von großflächigen {PECVD}-{P}rozessen zur
                      kontrollierten, homogenen {A}bscheidung dünner
                      {S}iliziumschichten für die {P}hotovoltaik},
      volume       = {462},
      school       = {RWTH Aachen University},
      type         = {Dissertation},
      address      = {Jülich},
      publisher    = {Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag},
      reportid     = {FZJ-2019-03053},
      isbn         = {978-3-95806-402-7},
      series       = {Schriften des Forschungszentrums Jülich Reihe Energie $\&$
                      Umwelt / Energy $\&$ Environment},
      pages        = {154 pp},
      year         = {2019},
      note         = {Dissertation, RWTH Aachen University, 2018},
      abstract     = {Hydrogenated microcrystalline silicon $(\&c-Si:H)$ is used,
                      among other things, as anabsorber layer in solar cells. To
                      produce $\&c-Si:H$ with homogeneous properties ona
                      large-area, industrial scale, using plasma enhanced chemical
                      vapor deposition,reproducible processes need to be
                      established.In the first part of this thesis, the
                      development of a reduced gas flowprocess to
                      producehomogeneous, large-area microcrystalline solar cells
                      is described. There are severalecological and economical
                      advantages when the gas consumption is decreased. Thecosts
                      for purchasing and storage of the feed gas are reduced. Due
                      to the significantlylower feed gas flows, the rotational
                      speed of the vacuum pumps can also be reduced.This results
                      in lower electrical power consumption of the vacuum pumps,
                      an extensionto their maintenance intervals, and an overall
                      increase in their service life. A vacuumsystem with a
                      standard industrial electrode was used during these
                      investigations.The geometry of the gas feed and the exhaust
                      is of great importance when $depositing\&c-Si:H$ with a
                      reduced gas flow. A mixture of silane and hydrogen gases is
                      fedinto the process volume through a so called showerhead
                      electrode and is bilaterallyexhausted. As the gas flow is
                      reduced, the residence time of the gas molecules inthe
                      plasma increases. Simultaneously, a higher concentration of
                      silane is used in thefeed gases, resulting in a higher
                      degree of silanemolecule dissociation. A
                      qualitativeplasma-growth model for the large-area deposition
                      of $\&c-Si:H$ describes the two maininfluences of reduced
                      gas usage on the local silane concentration in the plasma:
                      ...},
      cin          = {IEK-5},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {899 - ohne Topic (POF3-899)},
      pid          = {G:(DE-HGF)POF3-899},
      typ          = {PUB:(DE-HGF)3 / PUB:(DE-HGF)11},
      urn          = {urn:nbn:de:0001-2019073113},
      url          = {https://juser.fz-juelich.de/record/862854},
}