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@PHDTHESIS{Grootoonk:862854,
author = {Grootoonk, Björn},
title = {{E}ntwicklung von großflächigen {PECVD}-{P}rozessen zur
kontrollierten, homogenen {A}bscheidung dünner
{S}iliziumschichten für die {P}hotovoltaik},
volume = {462},
school = {RWTH Aachen University},
type = {Dissertation},
address = {Jülich},
publisher = {Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag},
reportid = {FZJ-2019-03053},
isbn = {978-3-95806-402-7},
series = {Schriften des Forschungszentrums Jülich Reihe Energie $\&$
Umwelt / Energy $\&$ Environment},
pages = {154 pp},
year = {2019},
note = {Dissertation, RWTH Aachen University, 2018},
abstract = {Hydrogenated microcrystalline silicon $(\&c-Si:H)$ is used,
among other things, as anabsorber layer in solar cells. To
produce $\&c-Si:H$ with homogeneous properties ona
large-area, industrial scale, using plasma enhanced chemical
vapor deposition,reproducible processes need to be
established.In the first part of this thesis, the
development of a reduced gas flowprocess to
producehomogeneous, large-area microcrystalline solar cells
is described. There are severalecological and economical
advantages when the gas consumption is decreased. Thecosts
for purchasing and storage of the feed gas are reduced. Due
to the significantlylower feed gas flows, the rotational
speed of the vacuum pumps can also be reduced.This results
in lower electrical power consumption of the vacuum pumps,
an extensionto their maintenance intervals, and an overall
increase in their service life. A vacuumsystem with a
standard industrial electrode was used during these
investigations.The geometry of the gas feed and the exhaust
is of great importance when $depositing\&c-Si:H$ with a
reduced gas flow. A mixture of silane and hydrogen gases is
fedinto the process volume through a so called showerhead
electrode and is bilaterallyexhausted. As the gas flow is
reduced, the residence time of the gas molecules inthe
plasma increases. Simultaneously, a higher concentration of
silane is used in thefeed gases, resulting in a higher
degree of silanemolecule dissociation. A
qualitativeplasma-growth model for the large-area deposition
of $\&c-Si:H$ describes the two maininfluences of reduced
gas usage on the local silane concentration in the plasma:
...},
cin = {IEK-5},
cid = {I:(DE-Juel1)IEK-5-20101013},
pnm = {899 - ohne Topic (POF3-899)},
pid = {G:(DE-HGF)POF3-899},
typ = {PUB:(DE-HGF)3 / PUB:(DE-HGF)11},
urn = {urn:nbn:de:0001-2019073113},
url = {https://juser.fz-juelich.de/record/862854},
}