000863535 001__ 863535
000863535 005__ 20240711113834.0
000863535 0247_ $$2doi$$a10.1088/1741-4326/ab235d
000863535 0247_ $$2ISSN$$a0029-5515
000863535 0247_ $$2ISSN$$a1741-4326
000863535 0247_ $$2altmetric$$aaltmetric:62803595
000863535 0247_ $$2WOS$$aWOS:000473496000001
000863535 037__ $$aFZJ-2019-03574
000863535 082__ $$a620
000863535 1001_ $$0P:(DE-Juel1)130070$$aKreter, A.$$b0$$eCorresponding author
000863535 245__ $$aInfluence of plasma impurities on the fuel retention in tungsten
000863535 260__ $$aVienna$$bIAEA$$c2019
000863535 3367_ $$2DRIVER$$aarticle
000863535 3367_ $$2DataCite$$aOutput Types/Journal article
000863535 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1562836495_29358
000863535 3367_ $$2BibTeX$$aARTICLE
000863535 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000863535 3367_ $$00$$2EndNote$$aJournal Article
000863535 520__ $$aThe retention of radioactive tritium in the reactor wall is a safety issue and should be kept to a minimum. We investigated the influence of helium, argon, neon and nitrogen as plasma impurities on the deuterium retention in tungsten in the linear plasma devices PSI-2 and PISCES-A. Following mixed plasmas were produced: pure D, D + He, D + Ar, D + Ne, D + N and D + He + Ar, with impurity fractions between 3% and 10%. Experiments were performed at tungsten sample temperatures of 500 and 770 K. The incident ion energy was 70 eV, above the tungsten sputtering threshold for argon and nitrogen, but below it for deuterium and helium. For neon, in addition, it was varied between 20 and 70 eV, below and above the tungsten sputtering threshold, respectively. The admixture of helium reduced the deuterium retention by a factor of 3–100, with a stronger reduction at a higher sample temperature. In the D + He + Ar case the retention was similar as for pure D. Argon sputtered the near-surface helium nanobubble layer and thus overrode the effect of helium. The effect of neon is sensitive to the incident ion energy. Addition of nitrogen increased the deuterium retention by a factor of ~10 and ~100 for 500 and 770 K, respectively. In general, the effect of impurities on the deuterium retention appears to be sensitive to the properties of the affected near-surface layer of tungsten. Admixed species, i.e. helium, can form a layer with open porosity, which serves as an additional release channel for deuterium thus decreasing the retention. However, if the process is dominated by sputtering, as for argon, such a layer cannot be formed. The nitrogen enriched layer, in contrast, serves as a desorption barrier for deuterium increasing the retention.
000863535 536__ $$0G:(DE-HGF)POF3-113$$a113 - Methods and Concepts for Material Development (POF3-113)$$cPOF3-113$$fPOF III$$x0
000863535 588__ $$aDataset connected to CrossRef
000863535 7001_ $$00000-0002-3119-4827$$aNishijima, D.$$b1
000863535 7001_ $$0P:(DE-HGF)0$$aDoerner, R. P.$$b2
000863535 7001_ $$0P:(DE-Juel1)130010$$aFreisinger, M.$$b3
000863535 7001_ $$0P:(DE-Juel1)157640$$aLinsmeier, Ch.$$b4
000863535 7001_ $$0P:(DE-Juel1)167463$$aMartynova, Y.$$b5
000863535 7001_ $$0P:(DE-Juel1)139534$$aMöller, S.$$b6
000863535 7001_ $$0P:(DE-Juel1)162160$$aRasinski, M.$$b7
000863535 7001_ $$00000-0002-6436-2129$$aReinhart, M.$$b8
000863535 7001_ $$0P:(DE-Juel1)130166$$aTerra, A.$$b9
000863535 7001_ $$0P:(DE-HGF)0$$aTorikai, Y.$$b10
000863535 7001_ $$0P:(DE-Juel1)6784$$aUnterberg, B.$$b11
000863535 773__ $$0PERI:(DE-600)2037980-8$$a10.1088/1741-4326/ab235d$$gVol. 59, no. 8, p. 086029 -$$n8$$p086029 -$$tNuclear fusion$$v59$$x1741-4326$$y2019
000863535 8564_ $$uhttps://juser.fz-juelich.de/record/863535/files/Kreter_2019_Nucl._Fusion_59_086029.pdf$$yRestricted
000863535 8564_ $$uhttps://juser.fz-juelich.de/record/863535/files/Kreter_2019_Nucl._Fusion_59_086029.pdf?subformat=pdfa$$xpdfa$$yRestricted
000863535 909CO $$ooai:juser.fz-juelich.de:863535$$pVDB
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130070$$aForschungszentrum Jülich$$b0$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130010$$aForschungszentrum Jülich$$b3$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)157640$$aForschungszentrum Jülich$$b4$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)167463$$aForschungszentrum Jülich$$b5$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)139534$$aForschungszentrum Jülich$$b6$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)162160$$aForschungszentrum Jülich$$b7$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130166$$aForschungszentrum Jülich$$b9$$kFZJ
000863535 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)6784$$aForschungszentrum Jülich$$b11$$kFZJ
000863535 9131_ $$0G:(DE-HGF)POF3-113$$1G:(DE-HGF)POF3-110$$2G:(DE-HGF)POF3-100$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bEnergie$$lEnergieeffizienz, Materialien und Ressourcen$$vMethods and Concepts for Material Development$$x0
000863535 9141_ $$y2019
000863535 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000863535 915__ $$0StatID:(DE-HGF)0430$$2StatID$$aNational-Konsortium
000863535 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bNUCL FUSION : 2017
000863535 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000863535 915__ $$0StatID:(DE-HGF)0600$$2StatID$$aDBCoverage$$bEbsco Academic Search
000863535 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bASC
000863535 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bClarivate Analytics Master Journal List
000863535 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000863535 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000863535 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000863535 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences
000863535 915__ $$0StatID:(DE-HGF)9900$$2StatID$$aIF < 5
000863535 920__ $$lyes
000863535 9201_ $$0I:(DE-Juel1)IEK-4-20101013$$kIEK-4$$lPlasmaphysik$$x0
000863535 9201_ $$0I:(DE-Juel1)IEK-1-20101013$$kIEK-1$$lWerkstoffsynthese und Herstellungsverfahren$$x1
000863535 980__ $$ajournal
000863535 980__ $$aVDB
000863535 980__ $$aI:(DE-Juel1)IEK-4-20101013
000863535 980__ $$aI:(DE-Juel1)IEK-1-20101013
000863535 980__ $$aUNRESTRICTED
000863535 981__ $$aI:(DE-Juel1)IFN-1-20101013
000863535 981__ $$aI:(DE-Juel1)IMD-2-20101013