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@ARTICLE{Hellwig:863536,
      author       = {Hellwig, Maren and Köppen, Martin and Hiller, Albert and
                      Koslowski, Hans and Litnovsky, Andrey and Schmid, Klaus and
                      Schwab, Christian and De Souza, Roger},
      title        = {{I}mpact of {S}urface {R}oughness on {I}on-{S}urface
                      {I}nteractions {S}tudied with {E}nergetic {C}arbon {I}ons
                      13{C}+ on {T}ungsten {S}urfaces},
      journal      = {Condensed Matter},
      volume       = {4},
      number       = {1},
      issn         = {2410-3896},
      address      = {Basel},
      publisher    = {MDPI},
      reportid     = {FZJ-2019-03575},
      pages        = {29 -},
      year         = {2019},
      abstract     = {The effect of surface roughness on angular distributions of
                      reflected and physically sputtered particles is investigated
                      by ultra-high vacuum (UHV) ion-surface interaction
                      experiments. For this purpose, a smooth (Ra = 5.9 nm) and a
                      rough (Ra = 20.5 nm) tungsten (W) surface were bombarded
                      with carbon ions 13C+ under incidence angles of 30° and
                      80°. Reflected and sputtered particles were collected on
                      foils to measure the resulting angular distribution as a
                      function of surface morphology. For the qualitative and
                      quantitative analysis, secondary ion mass spectrometry
                      (SIMS) and nuclear reaction analysis (NRA) were performed.
                      Simulations of ion-surface interactions were carried out
                      with the SDTrimSP (Static Dynamic Transport of Ions in
                      Matter Sputtering) code. For rough surfaces, a special
                      routine was derived and implemented. Experimental as well as
                      calculated results prove a significant impact of surface
                      roughness on the angular distribution of reflected and
                      sputtered particles. It is demonstrated that the effective
                      sticking of C on W is a function of the angle of incidence
                      and surface morphology. It is found that the predominant
                      ion-surface interaction process changes with fluence},
      cin          = {IEK-4},
      ddc          = {530},
      cid          = {I:(DE-Juel1)IEK-4-20101013},
      pnm          = {174 - Plasma-Wall-Interaction (POF3-174)},
      pid          = {G:(DE-HGF)POF3-174},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000464287700001},
      doi          = {10.3390/condmat4010029},
      url          = {https://juser.fz-juelich.de/record/863536},
}