000864661 001__ 864661
000864661 005__ 20210130002652.0
000864661 0247_ $$2doi$$a10.1016/j.sse.2019.03.037
000864661 0247_ $$2ISSN$$a0038-1101
000864661 0247_ $$2ISSN$$a1879-2405
000864661 0247_ $$2WOS$$aWOS:000471258000011
000864661 037__ $$aFZJ-2019-04359
000864661 082__ $$a620
000864661 1001_ $$0P:(DE-HGF)0$$aHan, Qinghua$$b0
000864661 245__ $$aTransient negative capacitance and charge trapping in FDSOI MOSFETs with ferroelectric HfYOX
000864661 260__ $$aOxford [u.a.]$$bPergamon, Elsevier Science$$c2019
000864661 3367_ $$2DRIVER$$aarticle
000864661 3367_ $$2DataCite$$aOutput Types/Journal article
000864661 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1568010569_22202
000864661 3367_ $$2BibTeX$$aARTICLE
000864661 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000864661 3367_ $$00$$2EndNote$$aJournal Article
000864661 520__ $$aSteep slope negative capacitance MOSFETs with HfYOx ferroelectric on FDSOI were experimentally demonstrated. An average SS of 30 mV/dec was achieved over 3 decades of drain current. The negative capacitance is believed to be a transient phenomenon because a strong polarization switching is needed for the steep slope. We found that the sub-thermal SS degrades with the cycling measurements, which is assumed to be caused by the trap charging in the ferroelectric oxide layer. The tradeoff between polarization and charge trapping is responsible for the subthreshold behavior of the device.
000864661 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000864661 588__ $$aDataset connected to CrossRef
000864661 7001_ $$0P:(DE-HGF)0$$aAleksa, Paulus$$b1
000864661 7001_ $$0P:(DE-HGF)0$$aTromm, Thomas Carl Ulrich$$b2
000864661 7001_ $$0P:(DE-Juel1)128631$$aSchubert, Jürgen$$b3
000864661 7001_ $$0P:(DE-Juel1)128609$$aMantl, Siegfried$$b4$$ufzj
000864661 7001_ $$0P:(DE-Juel1)128649$$aZhao, Qing-Tai$$b5$$eCorresponding author
000864661 773__ $$0PERI:(DE-600)2012825-3$$a10.1016/j.sse.2019.03.037$$gVol. 159, p. 71 - 76$$p71 - 76$$tSolid state electronics$$v159$$x0038-1101$$y2019
000864661 909CO $$ooai:juser.fz-juelich.de:864661$$pVDB
000864661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-HGF)0$$aForschungszentrum Jülich$$b0$$kFZJ
000864661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-HGF)0$$aForschungszentrum Jülich$$b1$$kFZJ
000864661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-HGF)0$$aForschungszentrum Jülich$$b2$$kFZJ
000864661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128631$$aForschungszentrum Jülich$$b3$$kFZJ
000864661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128609$$aForschungszentrum Jülich$$b4$$kFZJ
000864661 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128649$$aForschungszentrum Jülich$$b5$$kFZJ
000864661 9131_ $$0G:(DE-HGF)POF3-521$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Electron Charge-Based Phenomena$$x0
000864661 9141_ $$y2019
000864661 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000864661 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bSOLID STATE ELECTRON : 2017
000864661 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000864661 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline
000864661 915__ $$0StatID:(DE-HGF)0600$$2StatID$$aDBCoverage$$bEbsco Academic Search
000864661 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bASC
000864661 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bClarivate Analytics Master Journal List
000864661 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000864661 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000864661 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000864661 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences
000864661 915__ $$0StatID:(DE-HGF)1160$$2StatID$$aDBCoverage$$bCurrent Contents - Engineering, Computing and Technology
000864661 915__ $$0StatID:(DE-HGF)9900$$2StatID$$aIF < 5
000864661 920__ $$lyes
000864661 9201_ $$0I:(DE-Juel1)PGI-9-20110106$$kPGI-9$$lHalbleiter-Nanoelektronik$$x0
000864661 9201_ $$0I:(DE-82)080009_20140620$$kJARA-FIT$$lJARA-FIT$$x1
000864661 980__ $$ajournal
000864661 980__ $$aVDB
000864661 980__ $$aI:(DE-Juel1)PGI-9-20110106
000864661 980__ $$aI:(DE-82)080009_20140620
000864661 980__ $$aUNRESTRICTED