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024 7 _ |a 10.1016/j.mattod.2019.06.006
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100 1 _ |a Wang, Yue
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245 _ _ |a Mott-transition-based RRAM
260 _ _ |a Amsterdam [u.a.]
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520 _ _ |a Resistance random-access memory (RRAM) is a promising candidate for both the next-generation non-volatile memory and the key element of neural networks. In this article, different types of Mott-transition (the transition between the Mott insulator and metallic states) mechanisms and Mott-transition-based RRAM are reviewed. Mott insulators and some related doped systems can undergo an insulator-to-metal transition or metal-to-insulator transition under various excitation methods, such as pressure, temperature, and voltage. A summary of these driving forces that induce Mott-transition is presented together with their specific transition mechanisms for different materials. This is followed by a dynamics study of oxygen vacancy migration in voltage-driven non-volatile Mott-transition and the related resistive switching performance. We distinguish between a filling-controlled Mott-transition, which corresponds to the conventional valence change memory effect in band-insulators, and a bandwidth-controlled Mott-transition, which is due to a change in the bandwidth in the Mott system. Last, different types of Mott-RRAM-based neural network concepts are also discussed. The results in this review provide guidelines for the understanding, and further study and design of Mott-transition-based RRAM materials and their correlated devices.
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700 1 _ |a Kang, Kyung-Mun
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700 1 _ |a Kim, Minjae
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700 1 _ |a Lee, Hong-Sub
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700 1 _ |a Waser, R.
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700 1 _ |a Wouters, Dirk
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700 1 _ |a Dittmann, Regina
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700 1 _ |a Yang, J. Joshua
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700 1 _ |a Park, Hyung-Ho
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773 _ _ |a 10.1016/j.mattod.2019.06.006
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