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@ARTICLE{Zhao:872559,
      author       = {Zhao, Lan-Tian and Liu, Mingshan and Ren, Qing-Hua and Liu,
                      Chen-He and Liu, Qiang and Chen, Ling-Li and Spiegel, Yohann
                      and Torregrosa, Frank and Yu, Wenjie and Zhao, Qing-Tai},
      title        = {{P}hase evolution of ultra-thin {N}i silicide films on {CF}
                      4 plasma immersion ion implanted {S}i},
      journal      = {Nanotechnology},
      volume       = {31},
      number       = {20},
      issn         = {0957-4484},
      address      = {Bristol},
      publisher    = {IOP Publ.},
      reportid     = {FZJ-2020-00065},
      pages        = {205201 -},
      year         = {2020},
      abstract     = {We present a systematic study on the effects of CF4 plasma
                      immersion ion implantation (PIII) in Si on the phase
                      evolution of ultra-thin Ni silicides. For 3 nm Ni, NiSi2 was
                      formed on Si substrates with and without CF4 PIII at
                      temperature as low as 400 °C. For 6 nm Ni, NiSi was formed
                      on pure Si, while epitaxial NiSi2 was obtained on CF4 PIII
                      Si. The incorporation of C and F atoms in the thin epitaxial
                      NiSi2 significantly reduces the layer resistivity.
                      Increasing the Ni thickness to 8 nm results in the formation
                      of NiSi, where the thermal stability of NiSi, the NiSi/Si
                      interface and Schottky contacts are significantly improved
                      with CF4 PIII. We suggest that the interface energy is
                      lowered by the F and C dopants present in the layer and at
                      the interface, leading to phase evolution of the thin Ni
                      silicide.},
      cin          = {PGI-9},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-9-20110106},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)16},
      pubmed       = {pmid:31952059},
      UT           = {WOS:000518668500001},
      doi          = {10.1088/1361-6528/ab6d21},
      url          = {https://juser.fz-juelich.de/record/872559},
}