000873817 001__ 873817
000873817 005__ 20240711092255.0
000873817 0247_ $$2doi$$a10.1016/j.apsusc.2019.03.312
000873817 0247_ $$2ISSN$$a0169-4332
000873817 0247_ $$2ISSN$$a1873-5584
000873817 0247_ $$2Handle$$a2128/24328
000873817 0247_ $$2altmetric$$aaltmetric:59278124
000873817 0247_ $$2WOS$$aWOS:000464940900001
000873817 037__ $$aFZJ-2020-01022
000873817 082__ $$a660
000873817 1001_ $$0P:(DE-HGF)0$$aColl, M.$$b0
000873817 245__ $$aTowards Oxide Electronics: a Roadmap
000873817 260__ $$aAmsterdam$$bElsevier$$c2019
000873817 3367_ $$2DRIVER$$aarticle
000873817 3367_ $$2DataCite$$aOutput Types/Journal article
000873817 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1581674327_4397
000873817 3367_ $$2BibTeX$$aARTICLE
000873817 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000873817 3367_ $$00$$2EndNote$$aJournal Article
000873817 520__ $$aAt the end of a rush lasting over half a century, in which CMOS technology has been experiencing a constant and breathtaking increase of device speed and density, Moore’s law is approaching the insurmountable barrier given by the ultimate atomic nature of matter. A major challenge for 21st century scientists is finding novel strategies, concepts and materials for replacing silicon-based CMOS semiconductor technologies and guaranteeing a continued and steady technological progress in next decades. Among the materials classes candidate to contribute to this momentous challenge, oxide films and heterostructures are a particularly appealing hunting ground. The vastity, intended in pure chemical terms, of this class of compounds, the complexity of their correlated behaviour, and the wealth of functional properties they display, has already made these systems the subject of choice, worldwide, of a strongly networked, dynamic and interdisciplinary research community.
000873817 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000873817 588__ $$aDataset connected to CrossRef
000873817 7001_ $$0P:(DE-HGF)0$$aFontcuberta, J.$$b1
000873817 7001_ $$0P:(DE-HGF)0$$aAlthammer, M.$$b2
000873817 7001_ $$0P:(DE-HGF)0$$aBibes, M.$$b3
000873817 7001_ $$0P:(DE-HGF)0$$aBoschker, H.$$b4
000873817 7001_ $$0P:(DE-HGF)0$$aCalleja, A.$$b5
000873817 7001_ $$0P:(DE-Juel1)180398$$aCheng, G.$$b6$$ufzj
000873817 7001_ $$0P:(DE-HGF)0$$aCuoco, M.$$b7
000873817 7001_ $$0P:(DE-Juel1)130620$$aDittmann, R.$$b8
000873817 7001_ $$0P:(DE-HGF)0$$aDkhil, B.$$b9
000873817 7001_ $$0P:(DE-HGF)0$$aEl Baggari, I.$$b10
000873817 7001_ $$0P:(DE-HGF)0$$aFanciulli, M.$$b11
000873817 7001_ $$0P:(DE-HGF)0$$aFina, I.$$b12
000873817 7001_ $$0P:(DE-HGF)0$$aFortunato, E.$$b13
000873817 7001_ $$0P:(DE-HGF)0$$aFrontera, C.$$b14
000873817 7001_ $$0P:(DE-HGF)0$$aFujita, S.$$b15
000873817 7001_ $$0P:(DE-HGF)0$$aGarcia, V.$$b16
000873817 7001_ $$0P:(DE-HGF)0$$aGoennenwein, S. T. B.$$b17
000873817 7001_ $$0P:(DE-HGF)0$$aGranqvist, C.-G.$$b18
000873817 7001_ $$0P:(DE-HGF)0$$aGrollier, J.$$b19
000873817 7001_ $$aGross, R.$$b20
000873817 7001_ $$0P:(DE-HGF)0$$aHagfeldt, A.$$b21
000873817 7001_ $$0P:(DE-HGF)0$$aHerranz, G.$$b22
000873817 7001_ $$0P:(DE-HGF)0$$aHono, K.$$b23
000873817 7001_ $$0P:(DE-HGF)0$$aHouwman, E.$$b24
000873817 7001_ $$0P:(DE-Juel1)174222$$aHuijben, M.$$b25
000873817 7001_ $$0P:(DE-HGF)0$$aKalaboukhov, A.$$b26
000873817 7001_ $$0P:(DE-HGF)0$$aKeeble, D. J.$$b27
000873817 7001_ $$0P:(DE-HGF)0$$aKoster, G.$$b28
000873817 7001_ $$0P:(DE-HGF)0$$aKourkoutis, L. F.$$b29
000873817 7001_ $$0P:(DE-HGF)0$$aLevy, J.$$b30
000873817 7001_ $$0P:(DE-HGF)0$$aLira-Cantu, M.$$b31
000873817 7001_ $$0P:(DE-HGF)0$$aMacManus-Driscoll, J. L.$$b32
000873817 7001_ $$0P:(DE-HGF)0$$aMannhart, Jochen$$b33
000873817 7001_ $$0P:(DE-HGF)0$$aMartins, R.$$b34
000873817 7001_ $$aMenzel, S.$$b35
000873817 7001_ $$0P:(DE-HGF)0$$aMikolajick, T.$$b36
000873817 7001_ $$0P:(DE-HGF)0$$aNapari, M.$$b37
000873817 7001_ $$0P:(DE-HGF)0$$aNguyen, M. D.$$b38
000873817 7001_ $$0P:(DE-HGF)0$$aNiklasson, G.$$b39
000873817 7001_ $$0P:(DE-HGF)0$$aPaillard, C.$$b40
000873817 7001_ $$0P:(DE-HGF)0$$aPanigrahi, S.$$b41
000873817 7001_ $$0P:(DE-HGF)0$$aRijnders, G.$$b42
000873817 7001_ $$0P:(DE-HGF)0$$aSánchez, F.$$b43
000873817 7001_ $$0P:(DE-HGF)0$$aSanchis, P.$$b44
000873817 7001_ $$0P:(DE-HGF)0$$aSanna, S.$$b45
000873817 7001_ $$0P:(DE-HGF)0$$aSchlom, D. G.$$b46
000873817 7001_ $$0P:(DE-Juel1)130958$$aSchroeder, U.$$b47
000873817 7001_ $$0P:(DE-HGF)0$$aShen, K. M.$$b48
000873817 7001_ $$0P:(DE-HGF)0$$aSiemon, A.$$b49
000873817 7001_ $$0P:(DE-HGF)0$$aSpreitzer, M.$$b50
000873817 7001_ $$0P:(DE-HGF)0$$aSukegawa, H.$$b51
000873817 7001_ $$0P:(DE-HGF)0$$aTamayo, R.$$b52
000873817 7001_ $$0P:(DE-HGF)0$$avan den Brink, J.$$b53
000873817 7001_ $$0P:(DE-HGF)0$$aPryds, N.$$b54
000873817 7001_ $$0P:(DE-HGF)0$$aGranozio, F. Miletto$$b55$$eCorresponding author
000873817 773__ $$0PERI:(DE-600)2002520-8$$a10.1016/j.apsusc.2019.03.312$$gVol. 482, p. 1 - 93$$p1 - 93$$tApplied surface science$$v482$$x0169-4332$$y2019
000873817 8564_ $$uhttps://juser.fz-juelich.de/record/873817/files/1-s2.0-S0169433219309432-main.pdf$$yOpenAccess
000873817 8564_ $$uhttps://juser.fz-juelich.de/record/873817/files/1-s2.0-S0169433219309432-main.pdf?subformat=pdfa$$xpdfa$$yOpenAccess
000873817 909CO $$ooai:juser.fz-juelich.de:873817$$pdnbdelivery$$pdriver$$pVDB$$popen_access$$popenaire
000873817 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)180398$$aForschungszentrum Jülich$$b6$$kFZJ
000873817 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130620$$aForschungszentrum Jülich$$b8$$kFZJ
000873817 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)130958$$aForschungszentrum Jülich$$b47$$kFZJ
000873817 9131_ $$0G:(DE-HGF)POF3-521$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Electron Charge-Based Phenomena$$x0
000873817 9141_ $$y2019
000873817 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000873817 915__ $$0StatID:(DE-HGF)1160$$2StatID$$aDBCoverage$$bCurrent Contents - Engineering, Computing and Technology
000873817 915__ $$0StatID:(DE-HGF)0600$$2StatID$$aDBCoverage$$bEbsco Academic Search
000873817 915__ $$0LIC:(DE-HGF)CCBYNCND4$$2HGFVOC$$aCreative Commons Attribution-NonCommercial-NoDerivs CC BY-NC-ND 4.0
000873817 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bAPPL SURF SCI : 2017
000873817 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000873817 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000873817 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000873817 915__ $$0StatID:(DE-HGF)9900$$2StatID$$aIF < 5
000873817 915__ $$0StatID:(DE-HGF)0510$$2StatID$$aOpenAccess
000873817 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bASC
000873817 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences
000873817 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline
000873817 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000873817 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bClarivate Analytics Master Journal List
000873817 9201_ $$0I:(DE-Juel1)PGI-7-20110106$$kPGI-7$$lElektronische Materialien$$x0
000873817 9201_ $$0I:(DE-82)080009_20140620$$kJARA-FIT$$lJARA-FIT$$x1
000873817 9201_ $$0I:(DE-Juel1)IEK-2-20101013$$kIEK-2$$lWerkstoffstruktur und -eigenschaften$$x2
000873817 9201_ $$0I:(DE-Juel1)PGI-2-20110106$$kPGI-2$$lTheoretische Nanoelektronik$$x3
000873817 9801_ $$aFullTexts
000873817 980__ $$ajournal
000873817 980__ $$aVDB
000873817 980__ $$aI:(DE-Juel1)PGI-7-20110106
000873817 980__ $$aI:(DE-82)080009_20140620
000873817 980__ $$aI:(DE-Juel1)IEK-2-20101013
000873817 980__ $$aI:(DE-Juel1)PGI-2-20110106
000873817 980__ $$aUNRESTRICTED
000873817 981__ $$aI:(DE-Juel1)IMD-1-20101013