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@ARTICLE{Beale:874696,
      author       = {Beale, Christopher and Hamacher, Stefanie and Yakushenko,
                      Alexey and Bensaid, Oumaima and Willbold, Sabine and
                      Beltramo, Guillermo and Möller, Sören and Hartmann,
                      Heinrich and Neumann, Elmar and Mussler, Gregor and
                      Shkurmanov, Alexander and Mayer, Dirk and Wolfrum, Bernhard
                      and Offenhäusser, Andreas},
      title        = {{T}antalum( v ) 1,3-propanediolate β-diketonate solution
                      as a precursor to sol–gel derived, metal oxide thin films},
      journal      = {RSC Advances},
      volume       = {10},
      number       = {23},
      issn         = {2046-2069},
      address      = {London},
      publisher    = {RSC Publishing},
      reportid     = {FZJ-2020-01611},
      pages        = {13737 - 13748},
      year         = {2020},
      abstract     = {Tantalum oxide is ubiquitous in everyday life, from
                      capacitors in electronics to ion conductors for
                      electrochromic windows and electrochemical storage devices.
                      Investigations into sol–gel deposition of tantalum oxide,
                      and its sister niobium oxide, has accelerated since the
                      1980s and continues to this day. The aim of this study is to
                      synthesize a near UV sensitive, air stable, and low toxicity
                      tantalum sol–gel precursor solution for metal oxide thin
                      films – these attributes promise to reduce manufacturing
                      costs and allow for facile mass production. By utilizing 1D
                      and 2D nuclear magnetic resonance, this study shows that by
                      removing ethanol from the precursor solution at a relatively
                      low temperature and pressure, decomposition of the
                      photosensitive complex can be minimized while obtaining a
                      precursor solution with sufficient stability for storage and
                      processing in the atmosphere. The solution described herein
                      is further modified for inkjet printing, where multiple
                      material characterization techniques demonstrate that the
                      solution can be utilized in low temperature, photochemical
                      solution deposition of tantalum oxide, which is likely
                      amorphous. Tested substrates include amorphous silica,
                      crystalline silicon wafer, and gold/titanium/PET foil. The
                      hope is that these results may spark future investigations
                      into electronic, optical, and biomedical device fabrication
                      with tantalum oxide, and potentially niobium oxide, based
                      films using the proposed synthesis method.},
      cin          = {IBI-3 / IBI-2},
      ddc          = {540},
      cid          = {I:(DE-Juel1)IBI-3-20200312 / I:(DE-Juel1)IBI-2-20200312},
      pnm          = {523 - Controlling Configuration-Based Phenomena (POF3-523)},
      pid          = {G:(DE-HGF)POF3-523},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000530352000046},
      doi          = {10.1039/D0RA02558E},
      url          = {https://juser.fz-juelich.de/record/874696},
}