TY  - JOUR
AU  - Pries, Julian
AU  - Wei, Shuai
AU  - Hoff, Felix
AU  - Lucas, Pierre
AU  - Wuttig, Matthias
TI  - Control of effective cooling rate upon magnetron sputter deposition ofglassy Ge 15 Te 85
JO  - Scripta materialia
VL  - 178
SN  - 1359-6462
CY  - Amsterdam [u.a.]
PB  - Elsevier Science
M1  - FZJ-2020-01780
SP  - 223 - 226
PY  - 2020
AB  - Reducing the enthalpy of as-deposited amorphous films is desirable as it improves their kinetic stability and enhances the reliability of resulting devices. Here we demonstrate that Ge15Te85 glass films of lower enthalpy are produced by increasing the voltage during magnetron sputter deposition. An increase of ~100 V leads to a drop in effective cooling rate of almost three orders of magnitude, thereby yielding markedly lower enthalpy glasses. The sputtering voltage therefore constitutes a novel parameter for tuning the fictive temperature of glass films, which could help to obtain ultra-stable glasses in combination with substrate temperature control.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000510947200044
DO  - DOI:10.1016/j.scriptamat.2019.11.024
UR  - https://juser.fz-juelich.de/record/875068
ER  -