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@ARTICLE{Pries:875068,
author = {Pries, Julian and Wei, Shuai and Hoff, Felix and Lucas,
Pierre and Wuttig, Matthias},
title = {{C}ontrol of effective cooling rate upon magnetron sputter
deposition ofglassy {G}e 15 {T}e 85},
journal = {Scripta materialia},
volume = {178},
issn = {1359-6462},
address = {Amsterdam [u.a.]},
publisher = {Elsevier Science},
reportid = {FZJ-2020-01780},
pages = {223 - 226},
year = {2020},
abstract = {Reducing the enthalpy of as-deposited amorphous films is
desirable as it improves their kinetic stability and
enhances the reliability of resulting devices. Here we
demonstrate that Ge15Te85 glass films of lower enthalpy are
produced by increasing the voltage during magnetron sputter
deposition. An increase of ~100 V leads to a drop in
effective cooling rate of almost three orders of magnitude,
thereby yielding markedly lower enthalpy glasses. The
sputtering voltage therefore constitutes a novel parameter
for tuning the fictive temperature of glass films, which
could help to obtain ultra-stable glasses in combination
with substrate temperature control.},
cin = {PGI-10},
ddc = {670},
cid = {I:(DE-Juel1)PGI-10-20170113},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000510947200044},
doi = {10.1016/j.scriptamat.2019.11.024},
url = {https://juser.fz-juelich.de/record/875068},
}