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@ARTICLE{Pries:875068,
      author       = {Pries, Julian and Wei, Shuai and Hoff, Felix and Lucas,
                      Pierre and Wuttig, Matthias},
      title        = {{C}ontrol of effective cooling rate upon magnetron sputter
                      deposition ofglassy {G}e 15 {T}e 85},
      journal      = {Scripta materialia},
      volume       = {178},
      issn         = {1359-6462},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier Science},
      reportid     = {FZJ-2020-01780},
      pages        = {223 - 226},
      year         = {2020},
      abstract     = {Reducing the enthalpy of as-deposited amorphous films is
                      desirable as it improves their kinetic stability and
                      enhances the reliability of resulting devices. Here we
                      demonstrate that Ge15Te85 glass films of lower enthalpy are
                      produced by increasing the voltage during magnetron sputter
                      deposition. An increase of ~100 V leads to a drop in
                      effective cooling rate of almost three orders of magnitude,
                      thereby yielding markedly lower enthalpy glasses. The
                      sputtering voltage therefore constitutes a novel parameter
                      for tuning the fictive temperature of glass films, which
                      could help to obtain ultra-stable glasses in combination
                      with substrate temperature control.},
      cin          = {PGI-10},
      ddc          = {670},
      cid          = {I:(DE-Juel1)PGI-10-20170113},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000510947200044},
      doi          = {10.1016/j.scriptamat.2019.11.024},
      url          = {https://juser.fz-juelich.de/record/875068},
}