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| 001 | 875068 | ||
| 005 | 20210130004839.0 | ||
| 024 | 7 | _ | |a 10.1016/j.scriptamat.2019.11.024 |2 doi |
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| 037 | _ | _ | |a FZJ-2020-01780 |
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| 100 | 1 | _ | |a Pries, Julian |0 P:(DE-HGF)0 |b 0 |
| 245 | _ | _ | |a Control of effective cooling rate upon magnetron sputter deposition ofglassy Ge 15 Te 85 |
| 260 | _ | _ | |a Amsterdam [u.a.] |c 2020 |b Elsevier Science |
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| 520 | _ | _ | |a Reducing the enthalpy of as-deposited amorphous films is desirable as it improves their kinetic stability and enhances the reliability of resulting devices. Here we demonstrate that Ge15Te85 glass films of lower enthalpy are produced by increasing the voltage during magnetron sputter deposition. An increase of ~100 V leads to a drop in effective cooling rate of almost three orders of magnitude, thereby yielding markedly lower enthalpy glasses. The sputtering voltage therefore constitutes a novel parameter for tuning the fictive temperature of glass films, which could help to obtain ultra-stable glasses in combination with substrate temperature control. |
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| 700 | 1 | _ | |a Wei, Shuai |0 P:(DE-HGF)0 |b 1 |
| 700 | 1 | _ | |a Hoff, Felix |0 P:(DE-HGF)0 |b 2 |
| 700 | 1 | _ | |a Lucas, Pierre |0 0000-0003-1011-0855 |b 3 |e Corresponding author |
| 700 | 1 | _ | |a Wuttig, Matthias |0 P:(DE-Juel1)176716 |b 4 |
| 773 | _ | _ | |a 10.1016/j.scriptamat.2019.11.024 |g Vol. 178, p. 223 - 226 |0 PERI:(DE-600)2015843-9 |p 223 - 226 |t Scripta materialia |v 178 |y 2020 |x 1359-6462 |
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