000877429 001__ 877429
000877429 005__ 20210130005031.0
000877429 0247_ $$2doi$$a10.1016/j.flatc.2020.100164
000877429 0247_ $$2Handle$$a2128/25202
000877429 0247_ $$2WOS$$aWOS:000540780300004
000877429 037__ $$aFZJ-2020-02184
000877429 041__ $$aEnglish
000877429 082__ $$a540
000877429 1001_ $$0P:(DE-Juel1)128613$$aMikulics, M.$$b0$$eCorresponding author
000877429 245__ $$aLaser micro annealing conditioning for the suppression of statistical scatter in freestanding Sb2Te3 nanowire resistance
000877429 260__ $$aAmsterdam$$bElsevier$$c2020
000877429 3367_ $$2DRIVER$$aarticle
000877429 3367_ $$2DataCite$$aOutput Types/Journal article
000877429 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1593525044_1668
000877429 3367_ $$2BibTeX$$aARTICLE
000877429 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000877429 3367_ $$00$$2EndNote$$aJournal Article
000877429 520__ $$aThe effect of long-term laser micro annealing (LMA) on the statistical resistance scatter in freestanding Sb2Te3 layered nanowires (NWs) was studied during the formation of ohmic contacts. The process was developed and optimized by monitoring the evolution of the NW resistance and the DC photo-responsivity and correlating the characteristics to the structural degradation observed using micro Raman spectroscopy. The NWs were transferred to and integrated into Ti/Au coplanar strip lines on flexible polyethylene terephthalate (PET) substrates designed for optoelectronic applications. Four different stages in the NW resistance were revealed. The optimal “time-annealing” interval was identified, in which the lowest NW resistance was determined and in which no evidence for structural degradation processes in the active central NWs’ region was found. Low dark currents below 10−5 A at 100 mV bias as well as high DC photo-responsivity ~0.6 A/W were achieved rendering the nanowire devices as very promising candidates for highly sensitive infrared optoelectronics. The statistical scatter in the NW resistance was minimized to a range of ±10% of the total value by conditioning the contact/annealed regions of the NWs individually and tuning the resistance of these regions as a function of the total laser annealing time.
000877429 536__ $$0G:(DE-HGF)POF3-143$$a143 - Controlling Configuration-Based Phenomena (POF3-143)$$cPOF3-143$$fPOF III$$x0
000877429 588__ $$aDataset connected to CrossRef
000877429 7001_ $$0P:(DE-HGF)0$$aLu, J. G.$$b1
000877429 7001_ $$0P:(DE-Juel1)176702$$aHuang, L.$$b2
000877429 7001_ $$0P:(DE-HGF)0$$aTse, P. L.$$b3
000877429 7001_ $$0P:(DE-Juel1)145015$$aZhang, J. Z.$$b4
000877429 7001_ $$0P:(DE-Juel1)180571$$aMayer, J.$$b5
000877429 7001_ $$0P:(DE-Juel1)125593$$aHardtdegen, H.$$b6$$eCorresponding author
000877429 773__ $$0PERI:(DE-600)2873498-1$$a10.1016/j.flatc.2020.100164$$gVol. 21, p. 100164 -$$p100164 -$$tFlatChem$$v21$$x2452-2627$$y2020
000877429 8564_ $$uhttps://juser.fz-juelich.de/record/877429/files/Flatc_20_100164.pdf$$yPublished on 2020-04-07. Available in OpenAccess from 2022-04-07.
000877429 8564_ $$uhttps://juser.fz-juelich.de/record/877429/files/Flatc_20_100164.pdf?subformat=pdfa$$xpdfa$$yPublished on 2020-04-07. Available in OpenAccess from 2022-04-07.
000877429 909CO $$ooai:juser.fz-juelich.de:877429$$pdnbdelivery$$pdriver$$pVDB$$popen_access$$popenaire
000877429 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128613$$aForschungszentrum Jülich$$b0$$kFZJ
000877429 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)180571$$aForschungszentrum Jülich$$b5$$kFZJ
000877429 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)125593$$aForschungszentrum Jülich$$b6$$kFZJ
000877429 9131_ $$0G:(DE-HGF)POF3-143$$1G:(DE-HGF)POF3-140$$2G:(DE-HGF)POF3-100$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bEnergie$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Configuration-Based Phenomena$$x0
000877429 9141_ $$y2020
000877429 915__ $$0StatID:(DE-HGF)0530$$2StatID$$aEmbargoed OpenAccess
000877429 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS$$d2020-01-05
000877429 915__ $$0StatID:(DE-HGF)0112$$2StatID$$aWoS$$bEmerging Sources Citation Index$$d2020-01-05
000877429 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection$$d2020-01-05
000877429 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bClarivate Analytics Master Journal List$$d2020-01-05
000877429 920__ $$lyes
000877429 9201_ $$0I:(DE-Juel1)ER-C-2-20170209$$kER-C-2$$lMaterialwissenschaft u. Werkstofftechnik$$x0
000877429 980__ $$ajournal
000877429 980__ $$aVDB
000877429 980__ $$aUNRESTRICTED
000877429 980__ $$aI:(DE-Juel1)ER-C-2-20170209
000877429 9801_ $$aFullTexts