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@ARTICLE{Ertmer:877841,
      author       = {Ertmer, S. and Marchuk, O. and Dickheuer, S. and Rasiński,
                      M. and Kreter, A. and Brezinsek, S.},
      title        = {{L}ight-reflection-induced changes in the line shape of
                      sputtered atoms},
      journal      = {Physica scripta},
      volume       = {T171},
      issn         = {1402-4896},
      address      = {Stockholm},
      publisher    = {The Royal Swedish Academy of Sciences},
      reportid     = {FZJ-2020-02465},
      pages        = {014031 -},
      year         = {2020},
      abstract     = {The erosion from plasma-facing components has to be
                      monitored in many kind of laboratory and fusion plasmas. For
                      this purpose, spectroscopy is an essential tool. Under
                      certain conditions the particle flux can be calculated from
                      the absolute line intensities of the sputtered material
                      using so-called S/XB values. The impact of light reflection
                      on the emission induced by sputtered particles at the
                      mirror-grade polished surface of tungsten (W) and aluminum
                      (Al) was investigated in a low-density (n e ≈ 2 × 1012
                      cm−3) and low-temperature (T e ≈ $3\,\mathrm{eV}$) argon
                      (Ar) plasma in the linear plasma device PSI-2 using
                      high-resolution spectroscopy. Using the line shape affected
                      by Doppler shift we show that the light reflection has a
                      considerable impact on the number of measured photons and
                      has to be taken into account for calculating particle
                      fluxes. The Al target was sputtered by Ar ions at the
                      incident ion energy of $120\,\mathrm{eV}$. The measured
                      profile of the Al I line ($3961.52\,\mathring{\rm A} $) was
                      compared with a Doppler-shifted emission model based on the
                      Thompson energy distribution function. In this new model,
                      the instrumental broadening and the impact of the Zeeman
                      effect were also taken into account. The parameter for the
                      high-energy fall-off n of the energy distribution function
                      ($\propto 1/{E}^{n+1}$), the surface binding energy E b and
                      the surface reflectance were derived by comparing the
                      experimental and the synthetic spectrum. The W target was
                      sputtered by Ar ions at incident ion energies in the range
                      of $30$–$160\,\mathrm{eV}$. The influence of the ion
                      impact energy on the energy distribution of the sputtered
                      particles was demonstrated},
      cin          = {IEK-4},
      ddc          = {530},
      cid          = {I:(DE-Juel1)IEK-4-20101013},
      pnm          = {174 - Plasma-Wall-Interaction (POF3-174)},
      pid          = {G:(DE-HGF)POF3-174},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000520000600031},
      doi          = {10.1088/1402-4896/ab4923},
      url          = {https://juser.fz-juelich.de/record/877841},
}