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024 7 _ |a 10.1088/1402-4896/ab4923
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100 1 _ |a Ertmer, S.
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245 _ _ |a Light-reflection-induced changes in the line shape of sputtered atoms
260 _ _ |a Stockholm
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|b The Royal Swedish Academy of Sciences
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520 _ _ |a The erosion from plasma-facing components has to be monitored in many kind of laboratory and fusion plasmas. For this purpose, spectroscopy is an essential tool. Under certain conditions the particle flux can be calculated from the absolute line intensities of the sputtered material using so-called S/XB values. The impact of light reflection on the emission induced by sputtered particles at the mirror-grade polished surface of tungsten (W) and aluminum (Al) was investigated in a low-density (n e ≈ 2 × 1012 cm−3) and low-temperature (T e ≈ $3\,\mathrm{eV}$) argon (Ar) plasma in the linear plasma device PSI-2 using high-resolution spectroscopy. Using the line shape affected by Doppler shift we show that the light reflection has a considerable impact on the number of measured photons and has to be taken into account for calculating particle fluxes. The Al target was sputtered by Ar ions at the incident ion energy of $120\,\mathrm{eV}$. The measured profile of the Al I line ($3961.52\,\mathring{\rm A} $) was compared with a Doppler-shifted emission model based on the Thompson energy distribution function. In this new model, the instrumental broadening and the impact of the Zeeman effect were also taken into account. The parameter for the high-energy fall-off n of the energy distribution function ($\propto 1/{E}^{n+1}$), the surface binding energy E b and the surface reflectance were derived by comparing the experimental and the synthetic spectrum. The W target was sputtered by Ar ions at incident ion energies in the range of $30$–$160\,\mathrm{eV}$. The influence of the ion impact energy on the energy distribution of the sputtered particles was demonstrated
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700 1 _ |a Marchuk, O.
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700 1 _ |a Dickheuer, S.
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700 1 _ |a Rasiński, M.
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700 1 _ |a Kreter, A.
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700 1 _ |a Brezinsek, S.
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773 _ _ |a 10.1088/1402-4896/ab4923
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856 4 _ |y Published on 2020-03-04. Available in OpenAccess from 2021-03-04.
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856 4 _ |y Published on 2020-03-04. Available in OpenAccess from 2021-03-04.
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