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@ARTICLE{Siniscalchi:878238,
      author       = {Siniscalchi, Marco and Tierno, Davide and Moors, Kristof
                      and Tőkei, Zsolt and Adelmann, Christoph},
      title        = {{T}emperature-dependent resistivity of alternative metal
                      thin films},
      journal      = {Applied physics letters},
      volume       = {117},
      number       = {4},
      issn         = {1077-3118},
      address      = {Melville, NY},
      publisher    = {American Inst. of Physics},
      reportid     = {FZJ-2020-02707},
      pages        = {043104 -},
      year         = {2020},
      abstract     = {The temperature coefficients of the resistivity (TCR) of
                      Cu, Ru, Co, Ir, and W thin films have been investigated as a
                      function of film thickness below 10 nm. Ru, Co, and Ir
                      show bulk-like TCR values that are rather independent of the
                      thickness, whereas the TCR of Cu increases strongly with the
                      decreasing thickness. Thin W films show negative TCR values,
                      which can be linked to high disorder. The results are
                      qualitatively consistent with a temperature-dependent
                      semiclassical thin-film resistivity model that takes into
                      account phonon, surface, and grain boundary scattering. The
                      results indicate that the thin-film resistivity of Ru, Co,
                      and Ir is dominated by grain boundary scattering, whereas
                      that of Cu is strongly influenced by surface scattering.This
                      work was supported by imec's industrial affiliation program
                      on nano-interconnects. M.S. acknowledges co-funding by the
                      Erasmus+ program of the European Union. The authors would
                      like to thank Sofie Mertens and Thomas Witters (imec) for
                      the support of the PVD depositions as well as imec's
                      Materials and Components Analysis (MCA) Laboratory for the
                      electron micrographs, the atomic force microscopy, and the
                      Rutherford backscattering measurements.},
      cin          = {PGI-9},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-9-20110106},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000559784700001},
      doi          = {10.1063/5.0015048},
      url          = {https://juser.fz-juelich.de/record/878238},
}