%0 Book Section
%A Hardtdegen, A.
%A Zhang, H.
%A Hoffmann-Eifert, S.
%T Tuning the Performance of Pt/HfO2/Ti/Pt ReRAM Devices Obtained from Plasma-Enhanced Atomic Layer Deposition for HfO2 Thin Films
%V 75
%@ 1938-5862
%C Pennington, NJ
%M FZJ-2020-03720
%B ECS transactions
%P 177 - 184
%D 2016
%F PUB:(DE-HGF)7
%9 Contribution to a book
%U <Go to ISI:>//WOS:000578405600019
%R 10.1149/07506.0177ecst
%U https://juser.fz-juelich.de/record/885316