TY  - CHAP
AU  - Hardtdegen, A.
AU  - Zhang, H.
AU  - Hoffmann-Eifert, S.
TI  - Tuning the Performance of Pt/HfO2/Ti/Pt ReRAM Devices Obtained from Plasma-Enhanced Atomic Layer Deposition for HfO2 Thin Films
VL  - 75
SN  - 1938-5862
CY  - Pennington, NJ
M1  - FZJ-2020-03720
T2  - ECS transactions
SP  - 177 - 184
PY  - 2016
LB  - PUB:(DE-HGF)7
UR  - <Go to ISI:>//WOS:000578405600019
DO  - DOI:10.1149/07506.0177ecst
UR  - https://juser.fz-juelich.de/record/885316
ER  -