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@ARTICLE{Mueller:889300,
author = {Mueller, Michael P. and Gunkel, Felix and Hoffmann-Eifert,
Susanne and De Souza, Roger A.},
title = {{T}he importance of singly charged oxygen vacancies for
electrical conduction in monoclinic {H}f{O} 2},
journal = {Journal of applied physics},
volume = {129},
number = {2},
issn = {1089-7550},
address = {Melville, NY},
publisher = {American Inst. of Physics},
reportid = {FZJ-2021-00192},
pages = {025104 -},
year = {2021},
abstract = {The point-defect structure of monoclinic HfO2 (m-HfO2) was
studied by means of equilibrium electrical conductance
measurements as a function of temperature 1050≤T/K≤1200
and oxygen partial pressure −20≤log(pO2/bar)≤−2. The
total conductivity σ displayed similar behavior at each
temperature examined. In oxidizing conditions
(pO2≥10−7bar), the total conductivity increased with
increasing oxygen partial pressure and was assigned to hole
conduction. Around 10−10 bar, a region of almost
constant conductivity was found; this is ascribed to ionic
conduction by means of doubly charged oxygen vacancies. In
reducing conditions (pO2≤10−16bar), the total
conductivity surprisingly decreased with decreasing oxygen
partial pressure. Defect-chemical modeling indicates that
this behavior is consistent with the conversion of mobile
doubly charged oxygen vacancies into less mobile singly
charged vacancies by electron trapping. Point-defect
concentrations at the oxygen partial pressures relevant to
resistive switching devices are predicted and discussed.},
cin = {PGI-7 / PGI-10 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-7-20110106 / I:(DE-Juel1)PGI-10-20170113 /
$I:(DE-82)080009_20140620$},
pnm = {5233 - Memristive Materials and Devices (POF4-523)},
pid = {G:(DE-HGF)POF4-5233},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000608037800004},
doi = {10.1063/5.0036024},
url = {https://juser.fz-juelich.de/record/889300},
}