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@ARTICLE{Seema:890361,
      author       = {Seema and Tayal, Akhil and Amir, S. M. and Pütter, Sabine
                      and Mattauch, S. and Gupta, Mukul},
      title        = {{S}tructural, electronic, and magnetic properties of
                      {C}o$_{4}${N} thin films deposited using {H}i{PIMS}},
      journal      = {Journal of alloys and compounds},
      volume       = {863},
      issn         = {0925-8388},
      address      = {Lausanne},
      publisher    = {Elsevier},
      reportid     = {FZJ-2021-00906},
      pages        = {158052 -},
      year         = {2021},
      abstract     = {We studied the growth behavior, structural, electronic, and
                      magnetic properties of cobalt nitride (Co-N) thin films
                      deposited using direct current (dc) and high power impulse
                      magnetron sputtering (HiPIMS) processes. The N2 partial gas
                      flow () was varied in close intervals to achieve the optimum
                      conditions for the growth of the tetra cobalt nitride (Co4N)
                      phase. We found that Co-N films grown using the HiPIMS
                      process adopt (111) orientation as compared to the growth
                      taking place along the (100) direction in the dcMS process.
                      It was observed that HiPIMS grown Co-N films were superior
                      in terms of crystallite size and uniform surface morphology.
                      The local structure of films was investigated using x-ray
                      absorption fine structure (XAFS) measurements. We found that
                      the high energy of adatoms in the HiPIMS technique assisted
                      in the more excellent stabilization of fcc-Co and the novel
                      Co4N phase relative to the dcMS process. Magnetic properties
                      of Co-N thin films were studied using magneto-optical Kerr
                      effect, vibrating sample magnetometry and polarized neutron
                      reflectivity. It was found that though the saturation
                      magnetization remains almost similar in films grown by dcMS
                      or HiPIMS processes, they differ in terms of their magnetic
                      anisotropy. Such variation can be understood in terms of
                      differences in the growth mechanisms in dcMS and HiPIMS
                      processes affecting the resulting Co4N phase’s local
                      structure.},
      cin          = {JCNS-FRM-II / JCNS-4 / MLZ / JCNS-2},
      ddc          = {540},
      cid          = {I:(DE-Juel1)JCNS-FRM-II-20110218 /
                      I:(DE-Juel1)JCNS-4-20201012 / I:(DE-588b)4597118-3 /
                      I:(DE-Juel1)JCNS-2-20110106},
      pnm          = {6G4 - Jülich Centre for Neutron Research (JCNS) (FZJ)
                      (POF4-6G4) / 632 - Materials – Quantum, Complex and
                      Functional Materials (POF4-632)},
      pid          = {G:(DE-HGF)POF4-6G4 / G:(DE-HGF)POF4-632},
      experiment   = {EXP:(DE-MLZ)MARIA-20140101},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000621714200004},
      doi          = {10.1016/j.jallcom.2020.158052},
      url          = {https://juser.fz-juelich.de/record/890361},
}