001     890705
005     20210623131757.0
024 7 _ |a 2128/27273
|2 Handle
037 _ _ |a FZJ-2021-01138
041 _ _ |a English
100 1 _ |a Wu, Doudou
|0 P:(DE-Juel1)164849
|b 0
|e Corresponding author
245 _ _ |a MBE growth and characterization of InAs based core-shell nanowire arrays
|f 2020-01-06 - 2021-02-15
260 _ _ |a Jülich
|c 2021
|b Forschungszentrum Jülich
300 _ _ |a 82 p.
336 7 _ |a Output Types/Supervised Student Publication
|2 DataCite
336 7 _ |a Thesis
|0 2
|2 EndNote
336 7 _ |a MASTERSTHESIS
|2 BibTeX
336 7 _ |a masterThesis
|2 DRIVER
336 7 _ |a Master Thesis
|b master
|m master
|0 PUB:(DE-HGF)19
|s 1614610501_8757
|2 PUB:(DE-HGF)
336 7 _ |a SUPERVISED_STUDENT_PUBLICATION
|2 ORCID
502 _ _ |a Masterarbeit, RWTH Aachen, 2020
|c RWTH Aachen
|b Masterarbeit
|d 2020
|o 2021-02-02
520 _ _ |a Among III-V compound semiconductor nanowires, InAs nanowires have high electronmobility which make them suitable for low power field-effect transistors. The Fermi levelpinning above its conduction band minimum results in easy fabrication of ohmic contacts.However, due to the large surface-to-volume ratio of nanowires, the surface states canhave impact on the electrical property of InAs nanowires and therefore the influence ofpassivation is interesting to be investigated. The first part of this report focuses on themolecular beam epitaxy (MBE) growth of InAs nanowire arrays on prepatterned Si(111)substrates. Using a new in-situ Ga droplet assisted substrate preparation, a highreproducibility of the growth results with high nanowire yield is achieved. Afterwards, thein-situ passivation of InAs nanowire by Al2O3 shell using atomic layer deposition (ALD) issuccessfully realized. In addition, the MBE growth of InAs-Al0.6Ga0.4Sb core-shellnanowire is studied and the growth rate of AlGaSb shell is estimated. The second part isrelated to the fabrication of InAs nanowire-array based device using HSQ as planarizationlayer. After the fabrication, each nanowire array as a whole is connected by top andbottom electrodes vertically. The third part contains the DC electrical characterization ofthe InAs nanowire-array based devices at room temperature. The comparison betweenthe resistivity of unpassivated and Al2O3 passivated InAs nanowire arrays shows that thelatter is lower demonstrating the benefit demonstrating the benefit of passivation.
536 _ _ |a 522 - Quantum Computing (POF4-522)
|0 G:(DE-HGF)POF4-522
|c POF4-522
|x 0
|f POF IV
650 2 7 |a Materials Science
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|2 V:(DE-HGF)
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700 1 _ |a Lepsa, Mihail Ion
|0 P:(DE-Juel1)128603
|b 1
|e Thesis advisor
856 4 _ |u https://juser.fz-juelich.de/record/890705/files/MBE%20growth%20and%20characterization%20of%20InAs%20based%20core-shell%20nanowire%20arrays.pdf
|y OpenAccess
909 C O |o oai:juser.fz-juelich.de:890705
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910 1 _ |a Forschungszentrum Jülich
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910 1 _ |a Forschungszentrum Jülich
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913 0 _ |a DE-HGF
|b Key Technologies
|l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)
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|v Controlling Electron Charge-Based Phenomena
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913 1 _ |a DE-HGF
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914 1 _ |y 2021
915 _ _ |a OpenAccess
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920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
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980 _ _ |a master
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 1 _ |a FullTexts


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