%0 Journal Article
%A Schmitz, J.
%A Mutzke, A.
%A Litnovsky, A.
%A Klein, F.
%A Tan, Xiaoyue
%A Wegener, T.
%A Hansen, P.
%A Aghdassi, N.
%A Eksaeva, Alina
%A Rasinski, M.
%A Kreter, A.
%A Gonzalez-Julian, J.
%A Coenen, J. W.
%A Linsmeier, Ch.
%A Bram, M.
%T Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys
%J Journal of nuclear materials
%V 526
%@ 0022-3115
%C Amsterdam [u.a.]
%I Elsevier Science
%M FZJ-2021-01492
%P 151767 -
%D 2019
%X WCrY Smart Alloys are developed as first wall material of future fusion devices such as DEMO. They aim at behaving like pure W during plasma operation due to depletion of the alloying elements Cr and Y. The Cr concentration gradients induced by preferential plasma sputtering cause Cr-diffusion. The exposure of WCrY and W samples to pure D plasma, with a plasma ion energy of , is simulated using the dynamic version of SDTrimSP. Cr-diffusion is included into the model. Simulation results are compared with experimental results. At sample temperatures of more than 600∘C and sputtering by D plus residual oxygen in the plasma ion flux, the Cr-transport to the surface leads to enhanced erosion for WCrY samples. A diffusion coefficient for Cr in WCrY of the order of is determined. The suitability of WCrY as first wall armour and the influence of further effects, considering especially Cr-diffusion, is discussed.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000500777900033
%R 10.1016/j.jnucmat.2019.151767
%U https://juser.fz-juelich.de/record/891407