TY  - JOUR
AU  - Schmitz, J.
AU  - Mutzke, A.
AU  - Litnovsky, A.
AU  - Klein, F.
AU  - Tan, Xiaoyue
AU  - Wegener, T.
AU  - Hansen, P.
AU  - Aghdassi, N.
AU  - Eksaeva, Alina
AU  - Rasinski, M.
AU  - Kreter, A.
AU  - Gonzalez-Julian, J.
AU  - Coenen, J. W.
AU  - Linsmeier, Ch.
AU  - Bram, M.
TI  - Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys
JO  - Journal of nuclear materials
VL  - 526
SN  - 0022-3115
CY  - Amsterdam [u.a.]
PB  - Elsevier Science
M1  - FZJ-2021-01492
SP  - 151767 -
PY  - 2019
AB  - WCrY Smart Alloys are developed as first wall material of future fusion devices such as DEMO. They aim at behaving like pure W during plasma operation due to depletion of the alloying elements Cr and Y. The Cr concentration gradients induced by preferential plasma sputtering cause Cr-diffusion. The exposure of WCrY and W samples to pure D plasma, with a plasma ion energy of , is simulated using the dynamic version of SDTrimSP. Cr-diffusion is included into the model. Simulation results are compared with experimental results. At sample temperatures of more than 600∘C and sputtering by D plus residual oxygen in the plasma ion flux, the Cr-transport to the surface leads to enhanced erosion for WCrY samples. A diffusion coefficient for Cr in WCrY of the order of is determined. The suitability of WCrY as first wall armour and the influence of further effects, considering especially Cr-diffusion, is discussed.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000500777900033
DO  - DOI:10.1016/j.jnucmat.2019.151767
UR  - https://juser.fz-juelich.de/record/891407
ER  -