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@ARTICLE{Schmitz:891407,
      author       = {Schmitz, J. and Mutzke, A. and Litnovsky, A. and Klein, F.
                      and Tan, Xiaoyue and Wegener, T. and Hansen, P. and
                      Aghdassi, N. and Eksaeva, Alina and Rasinski, M. and Kreter,
                      A. and Gonzalez-Julian, J. and Coenen, J. W. and Linsmeier,
                      Ch. and Bram, M.},
      title        = {{P}referential sputtering induced {C}r-{D}iffusion during
                      plasma exposure of {WC}r{Y} smart alloys},
      journal      = {Journal of nuclear materials},
      volume       = {526},
      issn         = {0022-3115},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier Science},
      reportid     = {FZJ-2021-01492},
      pages        = {151767 -},
      year         = {2019},
      abstract     = {WCrY Smart Alloys are developed as first wall material of
                      future fusion devices such as DEMO. They aim at behaving
                      like pure W during plasma operation due to depletion of the
                      alloying elements Cr and Y. The Cr concentration gradients
                      induced by preferential plasma sputtering cause
                      Cr-diffusion. The exposure of WCrY and W samples to pure D
                      plasma, with a plasma ion energy of , is simulated using the
                      dynamic version of SDTrimSP. Cr-diffusion is included into
                      the model. Simulation results are compared with experimental
                      results. At sample temperatures of more than 600∘C and
                      sputtering by D plus residual oxygen in the plasma ion flux,
                      the Cr-transport to the surface leads to enhanced erosion
                      for WCrY samples. A diffusion coefficient for Cr in WCrY of
                      the order of is determined. The suitability of WCrY as first
                      wall armour and the influence of further effects,
                      considering especially Cr-diffusion, is discussed.},
      cin          = {IEK-4 / IEK-1},
      ddc          = {620},
      cid          = {I:(DE-Juel1)IEK-4-20101013 / I:(DE-Juel1)IEK-1-20101013},
      pnm          = {113 - Methods and Concepts for Material Development
                      (POF3-113)},
      pid          = {G:(DE-HGF)POF3-113},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000500777900033},
      doi          = {10.1016/j.jnucmat.2019.151767},
      url          = {https://juser.fz-juelich.de/record/891407},
}