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| 001 | 891407 | ||
| 005 | 20240711114031.0 | ||
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| 037 | _ | _ | |a FZJ-2021-01492 |
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| 100 | 1 | _ | |a Schmitz, J. |0 P:(DE-HGF)0 |b 0 |
| 245 | _ | _ | |a Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys |
| 260 | _ | _ | |a Amsterdam [u.a.] |c 2019 |b Elsevier Science |
| 336 | 7 | _ | |a article |2 DRIVER |
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| 520 | _ | _ | |a WCrY Smart Alloys are developed as first wall material of future fusion devices such as DEMO. They aim at behaving like pure W during plasma operation due to depletion of the alloying elements Cr and Y. The Cr concentration gradients induced by preferential plasma sputtering cause Cr-diffusion. The exposure of WCrY and W samples to pure D plasma, with a plasma ion energy of , is simulated using the dynamic version of SDTrimSP. Cr-diffusion is included into the model. Simulation results are compared with experimental results. At sample temperatures of more than 600∘C and sputtering by D plus residual oxygen in the plasma ion flux, the Cr-transport to the surface leads to enhanced erosion for WCrY samples. A diffusion coefficient for Cr in WCrY of the order of is determined. The suitability of WCrY as first wall armour and the influence of further effects, considering especially Cr-diffusion, is discussed. |
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| 700 | 1 | _ | |a Mutzke, A. |0 P:(DE-HGF)0 |b 1 |
| 700 | 1 | _ | |a Litnovsky, A. |0 P:(DE-Juel1)130090 |b 2 |e Corresponding author |
| 700 | 1 | _ | |a Klein, F. |0 P:(DE-HGF)0 |b 3 |
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| 700 | 1 | _ | |a Bram, M. |0 P:(DE-Juel1)129591 |b 14 |
| 773 | _ | _ | |a 10.1016/j.jnucmat.2019.151767 |g Vol. 526, p. 151767 - |0 PERI:(DE-600)2001279-2 |p 151767 - |t Journal of nuclear materials |v 526 |y 2019 |x 0022-3115 |
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