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@PHDTHESIS{Kindelmann:897474,
      author       = {Kindelmann, Moritz},
      title        = {{F}ield assisted sintering of yttria ceramics for plasma
                      etching applications},
      volume       = {553},
      school       = {RWTH Aachen},
      type         = {Dissertation},
      address      = {Jülich},
      publisher    = {Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag},
      reportid     = {FZJ-2021-03807},
      isbn         = {978-3-95806-579-6},
      series       = {Schriften des Forschungszentrums Jülich. Reihe Energie
                      $\&$ Umwelt / Energy $\&$ Environment},
      pages        = {VI, 122, XXX S.},
      year         = {2021},
      note         = {RWTH Aachen, Diss., 2021},
      abstract     = {Advanced ceramics materials like yttrium oxide
                      (Y$_{2}$O$_{3}$) are of high interest for critical
                      manufacturing processes in the semiconductor industry due to
                      their high chemical stability in contact with fluorine based
                      etching plasmas. However, until now Y$_{2}$O$_{3}$ gets
                      primarily applied as a functional coating deposited by
                      thermal spray or aerosol deposition technique due to
                      complications associated with the manufacturing of bulk
                      ceramic components. Yttria exhibits a low sinterability when
                      conventionally processed and fabricating large scale samples
                      with high performance concerning chemical purity and
                      relative density is a challenging task. Complex processing
                      routes using conventional or vacuum sintering and an
                      additional post-compaction step by hot isostatic pressing
                      are necessary to achieve relative densities which are
                      matching the requirements of the semiconductor industry.
                      These major drawbacks have prevented the application of bulk
                      Y$_{2}$O$_{3}$ components in state of the art semiconductor
                      manufacturing devices. Therefore, in this work, field
                      assisted sintering technique /spark plasma sintering
                      (FAST/SPS) is investigated as a straight forward processing
                      technique which enables to consolidate high performance,
                      dense ceramic components in a single processing step. In two
                      separate parts, applied and fundamental research questions
                      are going to be addressed. The first part of this work
                      focuses on evaluating the direct processability of
                      commercial powders, solving challenges during the upscaling
                      of sample sizes, processing of complex shaped components as
                      well as characterizing the impact of rare earth doping on
                      sintering and grain growth. Upscaling of ceramic samples is
                      generally hindered by the formation of thermal
                      inhomogeneities in the tool setup. Therefore the application
                      of carbon fibre reinforced carbon spacers and their optimal
                      position in the FAST/SPS tool was investigated by coupling
                      experiments and simulations. Furthermore, graphite powder
                      bed assisted FAST/SPS was applied to study the possibilities
                      of sintering multiple complex shaped Y$_{2}$O$_{3}$ samples
                      in one step. Lastly, the influence of rare earth doping with
                      La$^{3+}$ and Gd$^{3+}$ on sintering and grain growth of
                      Y$_{2}$O$_{3}$ during FAST/SPS processing was studied
                      thoroughly. The segregation of La$^{3+}$ decelerated both
                      sintering and grain boundary kinetics through a solute drage
                      ffect, effectively preventing pore detachment at high
                      sintering temperatures and leading to enhanced densification
                      in the final stage of sintering. [...]},
      cin          = {IEK-1 / ER-C-2},
      cid          = {I:(DE-Juel1)IEK-1-20101013 / I:(DE-Juel1)ER-C-2-20170209},
      pnm          = {899 - ohne Topic (POF4-899)},
      pid          = {G:(DE-HGF)POF4-899},
      typ          = {PUB:(DE-HGF)3 / PUB:(DE-HGF)11},
      url          = {https://juser.fz-juelich.de/record/897474},
}