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@ARTICLE{Kindelmann:902641,
author = {Kindelmann, Moritz and Weber, Moritz L. and Stamminger,
Mark and Buschhaus, Rahel and Wessel, Egbert and Bram,
Martin and Guillon, Olivier},
title = {{T}he role of fluorination during the physicochemical
erosion of yttria in fluorine-based etching plasmas},
journal = {Journal of the European Ceramic Society},
volume = {42},
number = {2},
issn = {0955-2219},
address = {Amsterdam [u.a.]},
publisher = {Elsevier Science},
reportid = {FZJ-2021-04436},
pages = {561 - 566},
year = {2022},
abstract = {A physicochemical mechanism acting between the reactive
plasma and the material surface controls the erosion of
polycrystalline ceramics in fluorine containing etching
plasmas. In this study, a Y2O3/YOF composite was exposed to
a fluorine etching plasma. Relocalization enables the direct
correlation of crystalline orientation with material
response. Our study reveals an orientation dependent surface
fluorination of Y2O3, which controls the etching resistance
and morphology formation. Orientations near the low index
planes (001), (010) and (100) exhibit the lowest stability
due to a homogeneous surface reaction. The presented results
help to extend the mechanistic understanding of the
plasma-material interaction of Y2O3.},
cin = {PGI-7 / ER-C-2 / IEF-1 / IEK-2},
ddc = {660},
cid = {I:(DE-Juel1)PGI-7-20110106 / I:(DE-Juel1)ER-C-2-20170209 /
I:(DE-Juel1)VDB809 / I:(DE-Juel1)IEK-2-20101013},
pnm = {5233 - Memristive Materials and Devices (POF4-523) / 5353 -
Understanding the Structural and Functional Behavior of
Solid State Systems (POF4-535)},
pid = {G:(DE-HGF)POF4-5233 / G:(DE-HGF)POF4-5353},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000722274800003},
doi = {10.1016/j.jeurceramsoc.2021.10.061},
url = {https://juser.fz-juelich.de/record/902641},
}