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@INPROCEEDINGS{Gebrewold:902769,
      author       = {Gebrewold, Habtamu Tsegaye and Bittkau, Karsten and Qiu,
                      Kaifu and Ding, Kaining},
      title        = {{N}umerical study of {S}ilicon {H}eterojunction {S}olar
                      {C}ells with nc-{S}i{C}/{S}i{O} 2 {B}ased {T}ransparent
                      {P}assivating {C}ontact},
      publisher    = {IEEE},
      reportid     = {FZJ-2021-04540},
      pages        = {1115-1117},
      year         = {2021},
      abstract     = {Silicon heterojunction with nc-SiC(n)/SiO2 based front
                      transparent passivating contact (TPC) is numerically
                      modeled. The model is then used to study the effect of
                      active dopant concentration at the front and rear contact of
                      the solar cell. A potential of power conversion efficiency
                      above 25 $\%$ can be achieved with a suitable acceptor
                      dopant concentration of p-type amorphous silicon at the rear
                      side. Improving fill factor via SiC dopant concentration can
                      enhance the cell power conversion efficiency within a narrow
                      range of active dopant concentration. However, very high
                      doping of SiC can affect the cell performance negatively.},
      month         = {Jun},
      date          = {2021-06-20},
      organization  = {2021 IEEE 48th Photovoltaic
                       Specialists Conference (PVSC), Fort
                       Lauderdale (USA), 20 Jun 2021 - 25 Jun
                       2021},
      cin          = {IEK-5},
      cid          = {I:(DE-Juel1)IEK-5-20101013},
      pnm          = {1213 - Cell Design and Development (POF4-121) /
                      Verbundvorhaben: TuKaN - Tunnelkontakte auf N-Typ: für die
                      Metallisierung mit Siebdruck, Teilvorhaben: Herstellung von
                      Solarzellen mit passivierendem Tunnelkontakt und
                      funktionalen Schichten aus katalytischer und
                      plasmaunterstützter chemischer Gasphasenab (0324198D)},
      pid          = {G:(DE-HGF)POF4-1213 / G:(BMWi)0324198D},
      typ          = {PUB:(DE-HGF)8},
      UT           = {WOS:000701690400255},
      doi          = {10.1109/PVSC43889.2021.9519034},
      url          = {https://juser.fz-juelich.de/record/902769},
}