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@ARTICLE{TalamasSimola:903469,
author = {Talamas Simola, Enrico and Kiyek, Vivien and Ballabio,
Andrea and Schlykow, Viktoria and Frigerio, Jacopo and
Zucchetti, Carlo and De Iacovo, Andrea and Colace, Lorenzo
and Yamamoto, Yuji and Capellini, Giovanni and Grützmacher,
Detlev and Buca, Dan and Isella, Giovanni},
title = {{CMOS}-{C}ompatible {B}ias-{T}unable {D}ual-{B}and
{D}etector {B}ased on {G}e{S}n/{G}e/{S}i {C}oupled
{P}hotodiodes},
journal = {ACS photonics},
volume = {8},
number = {7},
issn = {2330-4022},
address = {Washington, DC},
publisher = {ACS},
reportid = {FZJ-2021-05141},
pages = {2166 - 2173},
year = {2021},
abstract = {Infrared (IR) multispectral detection is
attractingincreasing interest with the rising demand for
high spectralsensitivity, room temperature operation,
CMOS-compatible devices.Here, we present a two-terminal
dual-band detector, which providesa bias-switchable spectral
response in two distinct IR bands. Thedevice is obtained
from a vertical GeSn/Ge/Si stack, forming adouble junction
n-i-p-i-n structure, epitaxially grown on a Si wafer.The
photoresponse can be switched by inverting the bias
polaritybetween the near and the short-wave IR bands, with
specificdetectivities of 1.9 × 1010 and 4.0 × 109
cm·(Hz)1/2/W, respectively.The possibility of detecting two
spectral bands with the same pixelopens up interesting
applications in the field of IR imaging andmaterial
recognition, as shown in a solvent detection test.
Thecontinuous voltage tuning, combined with the nonlinear
photoresponse of the detector, enables a novel approach to
spectral analysis,demonstrated by identifying the wavelength
of a monochromatic beam.},
cin = {PGI-9},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106},
pnm = {5234 - Emerging NC Architectures (POF4-523) /
Verbundprojekt: Nanostrukturierte GeSn Beschichtungen für
die Photonik (GESNAPHOTO) - Teilvorhaben: Entwicklung
neuartiger Detektoren und Emitter basierend auf GeSn
Schichtstrukturen (13N14159) / Verbundprojekt: Erforschung
nanoelektronischer Höchstleistungs-Bauelemente für
innovative Elektronik auf Basis neuer Materialsysteme -
ForMikro-SiGeSn-NanoFETs - , Teilvorhaben: CVD-basierte
Herstellung von SiGeSn-Halbleiterheterostrukturen und
vertikalen (16ES1074)},
pid = {G:(DE-HGF)POF4-5234 / G:(BMBF)13N14159 / G:(BMBF)16ES1074},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000677543700038},
doi = {10.1021/acsphotonics.1c00617},
url = {https://juser.fz-juelich.de/record/903469},
}