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000903695 1001_ $$0P:(DE-HGF)0$$aMoskovkin, P.$$b0
000903695 245__ $$aLink between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering
000903695 260__ $$aAmsterdam [u.a.]$$bElsevier Science$$c2021
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000903695 7001_ $$0P:(DE-HGF)0$$aMaszl, C.$$b1
000903695 7001_ $$0P:(DE-Juel1)161348$$aSchierholz, Roland$$b2$$ufzj
000903695 7001_ $$0P:(DE-HGF)0$$aBreilmann, W.$$b3
000903695 7001_ $$0P:(DE-HGF)0$$aPetersen, J.$$b4
000903695 7001_ $$0P:(DE-HGF)0$$aPflug, A.$$b5
000903695 7001_ $$0P:(DE-HGF)0$$aMuller, J.$$b6
000903695 7001_ $$0P:(DE-HGF)0$$aRaza, M.$$b7
000903695 7001_ $$0P:(DE-HGF)0$$aKonstantinidis, S.$$b8
000903695 7001_ $$0P:(DE-HGF)0$$avon Keudell, A.$$b9
000903695 7001_ $$0P:(DE-HGF)0$$aLucas, S.$$b10$$eCorresponding author
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