Home > Publications database > Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering > print

001     903695
005     20240709082001.0
024 7 _ |a 10.1016/j.surfcoat.2021.127235
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024 7 _ |a 0257-8972
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024 7 _ |a 1879-3347
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082 _ _ |a 670
100 1 _ |a Moskovkin, P.
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245 _ _ |a Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering
260 _ _ |a Amsterdam [u.a.]
|c 2021
|b Elsevier Science
336 7 _ |a article
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536 _ _ |a 1223 - Batteries in Application (POF4-122)
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700 1 _ |a Maszl, C.
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700 1 _ |a Schierholz, Roland
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700 1 _ |a Breilmann, W.
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700 1 _ |a Petersen, J.
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700 1 _ |a Pflug, A.
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700 1 _ |a Muller, J.
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700 1 _ |a Raza, M.
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700 1 _ |a Konstantinidis, S.
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700 1 _ |a von Keudell, A.
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700 1 _ |a Lucas, S.
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773 _ _ |a 10.1016/j.surfcoat.2021.127235
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914 1 _ |y 2021
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