Home > Publications database > In situ spectroscopic ellipsometry as a pathway toward achieving VO 2 stoichiometry for amorphous vanadium oxide with magnetron sputtering > print

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024 7 _ |a 10.1063/5.0041116
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037 _ _ |a FZJ-2022-00474
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100 1 _ |a Xu, C.
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245 _ _ |a In situ spectroscopic ellipsometry as a pathway toward achieving VO 2 stoichiometry for amorphous vanadium oxide with magnetron sputtering
260 _ _ |a New York, NY
|c 2021
|b American Inst. of Physics
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536 _ _ |a 5233 - Memristive Materials and Devices (POF4-523)
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700 1 _ |a Heinemeyer, F.
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700 1 _ |a Dittrich, A.
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700 1 _ |a Bäumer, C.
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700 1 _ |a Reineke-Koch, R.
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773 _ _ |a 10.1063/5.0041116
|g Vol. 11, no. 3, p. 035126 -
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|x 2158-3226
856 4 _ |u https://juser.fz-juelich.de/record/905191/files/5.0041116.pdf
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