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@ARTICLE{Cielik:905934,
      author       = {Cieślik, K. and Wrana, D. and Szajna, K. and Bełza, W.
                      and Rogala, M. and Rodenbücher, C. and Dąbczyński, P. and
                      Szot, K. and Krok, F.},
      title        = {{T}uning the electronic properties of a clean {T}i{O}2(1 1
                      0) surface via repeated sputtering and annealing: {A} {KPFM}
                      and {LC}-{AFM} study},
      journal      = {Applied surface science},
      volume       = {571},
      issn         = {0169-4332},
      address      = {Amsterdam},
      publisher    = {Elsevier},
      reportid     = {FZJ-2022-01116},
      pages        = {151303 -},
      year         = {2022},
      cin          = {IEK-14},
      ddc          = {660},
      cid          = {I:(DE-Juel1)IEK-14-20191129},
      pnm          = {1231 - Electrochemistry for Hydrogen (POF4-123)},
      pid          = {G:(DE-HGF)POF4-1231},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000721017000003},
      doi          = {10.1016/j.apsusc.2021.151303},
      url          = {https://juser.fz-juelich.de/record/905934},
}